D
D. Tetzlaff
Researcher at Leibniz University of Hanover
Publications - 26
Citations - 701
D. Tetzlaff is an academic researcher from Leibniz University of Hanover. The author has contributed to research in topics: Silicon & Passivation. The author has an hindex of 12, co-authored 26 publications receiving 532 citations. Previous affiliations of D. Tetzlaff include Braunschweig University of Technology.
Papers
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Working principle of carrier selective poly-Si/c-Si junctions: Is tunnelling the whole story?
Robby Peibst,Udo Römer,Yevgeniya Larionova,Michael Rienäcker,Agnes Merkle,Nils Folchert,Sina Reiter,Mircea Turcu,B. Min,Jan Krügener,D. Tetzlaff,Eberhard Bugiel,Tobias Wietler,Rolf Brendel +13 more
TL;DR: In this article, the authors present an alternative picture, essentially based on a localized current flow through the interfacial oxide, mediated either by local reduction of the oxide layer thickness or by pinholes.
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Parasitic Absorption in Polycrystalline Si-layers for Carrier-selective Front Junctions
Sina Reiter,Nico Koper,Rolf Reineke-Koch,Yevgeniya Larionova,Mircea Turcu,Jan Krügener,D. Tetzlaff,Tobias Wietler,Uwe Hohne,Jan-Dirk Kähler,Rolf Brendel,Robby Peibst +11 more
TL;DR: In this paper, the optical properties of n-and p-type polycrystalline silicon (poly-Si) layers were investigated using variable-angle spectroscopic ellipsometry.
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Pinhole density and contact resistivity of carrier selective junctions with polycrystalline silicon on oxide
Tobias Wietler,D. Tetzlaff,Jan Krügener,Michael Rienäcker,Felix Haase,Yevgeniya Larionova,Rolf Brendel,Robby Peibst +7 more
TL;DR: In this paper, the pinhole formation induced in the thermal processing of the poly-Si on oxide (POLO) junctions is investigated and the resulting pinhole densities are in the range of 6.6
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On the recombination behavior of p+‐type polysilicon on oxide junctions deposited by different methods on textured and planar surfaces
Yevgeniya Larionova,Mircea Turcu,Sina Reiter,Rolf Brendel,D. Tetzlaff,Jan Krügener,Tobias Wietler,Uwe Hohne,Jan-Dirk Kähler,Robby Peibst +9 more
TL;DR: In this article, the passivation quality of hole-collecting junctions consisting of thermally or wet-chemically grown interfacial oxides, sandwiched between a monocrystalline-Si substrate and a p-type polycrystalline silicon (Si) layer was investigated.