D
Dong Lin
Researcher at Fudan University
Publications - 17
Citations - 133
Dong Lin is an academic researcher from Fudan University. The author has contributed to research in topics: Thin-film transistor & Amorphous solid. The author has an hindex of 6, co-authored 14 publications receiving 99 citations. Previous affiliations of Dong Lin include Jimei University.
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H2O adsorption on amorphous In-Ga-Zn-O thin-film transistors under negative bias stress
Jianwen Yang,Po-Yung Liao,Ting-Chang Chang,Hsiao-Cheng Chiang,Bo-Wei Chen,Yu-Chieh Chien,Dong Lin,Jinhua Ren,Ruofan Fu,Mingyue Qu,Shubin Pi,Yanbing Han,Haoqing Kang,Qun Zhang +13 more
TL;DR: Amorphous In-Ga-Zn-O thin-film transistors on flexible substrates were prepared to investigate H2O adsorption under negative bias stress (NBS) as mentioned in this paper.
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Solution-processed amorphous gallium-tin oxide thin film for low-voltage, high-performance transistors
TL;DR: In this paper, an optimized GTO channel layer was applied in the high-k Al2O3 thin-film transistor (TFT) with a low operation voltage of 2.67V and an on-off current ratio of 1.8×107.
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Vacuum laser acceleration in circularly polarized fields
TL;DR: In this paper, the characteristics of vacuum laser acceleration in circularly polarized (CP) fields with the capture and acceleration scenario (CAS) scheme were investigated, and the output properties of the accelerated CAS electron bunch, such as the energy spectra, the angular distributions, the energy-angle correlations, the acceleration efficiency, the rms emittance and the energy divergence, were examined.
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Polarization effect of fields on vacuum laser acceleration
TL;DR: In this paper, a comparison was made between using circularly polarized (CP) laser field and linearly polarized (LP) field, and it was found that the main advantage for using CP field is that its acceleration channel occupies relatively larger phase space, which can give rise to greater acceleration efficiency.