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G

G.B. Gao

Researcher at University of Illinois at Urbana–Champaign

Publications -  31
Citations -  564

G.B. Gao is an academic researcher from University of Illinois at Urbana–Champaign. The author has contributed to research in topics: Bipolar junction transistor & Heterojunction bipolar transistor. The author has an hindex of 12, co-authored 31 publications receiving 560 citations.

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Emitter ballasting resistor design for, and current handling capability of AlGaAs/GaAs power heterojunction bipolar transistors

TL;DR: In this article, the emitter ballasting resistor for power heterojunction bipolar transistors (HBTs) was investigated and the current handling capability of power HBTs was found to improve with ballasting resistance.
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Strained layer heterostructures, and their applications to MODFETs, HBTs, and lasers

TL;DR: In this article, a review of recent developments in strained layer epitaxial systems is presented, which can be tailored to a particular application with, in many cases, performances that are and out of reach with lattice-matched systems alone.
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Use of the three-dimensional TLM method in the thermal simulation and design of semiconductor devices

TL;DR: In this article, the thermal behavior of semiconductor devices fabricated with a variety of different materials has been analyzed using the three-dimensional transmission-line matrix (TLM) method, which can easily incorporate the temperature dependence of thermal parameters, is numerically stable and compares favorably with other numerical techniques in computational expenditure and convenience in modeling complex geometries.
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Heterojunction bipolar transistor design for power applications

TL;DR: In this article, design rules of AlGaAs-GaAs heterojunction bipolar transistors for power applications are presented and compared to those for Si microwave power transistors, including the tradeoff between power gain, output power, power-added efficiency in the layout design, layer structure selection, and thermal design.
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GaAs/Ge/GaAs heterostructures by molecular beam epitaxy

TL;DR: In this article, high quality GaAs/Ge/GaAs heterojunctions grown by molecular beam epitaxy were reported, and the electrical properties of the heterjunctions were studied and the transistor characteristics of a prototype N−Al0.22Ga0.78As/p+•Ge/n−GaAs bipolar transistor was presented.