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G

G. Kamarinos

Researcher at École nationale supérieure d'électronique et de radioélectricité de Grenoble

Publications -  97
Citations -  1277

G. Kamarinos is an academic researcher from École nationale supérieure d'électronique et de radioélectricité de Grenoble. The author has contributed to research in topics: Thin-film transistor & Polycrystalline silicon. The author has an hindex of 20, co-authored 97 publications receiving 1237 citations.

Papers
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Effect of excimer laser annealing on the structural and electrical properties of polycrystalline silicon thin-film transistors

TL;DR: In this article, the structural and electrical properties of polycrystalline silicon thin-film transistors (polysilicon TFTs) were investigated in relation to the laser energy density.
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On-current modeling of large-grain polycrystalline silicon thin-film transistors

TL;DR: In this article, a linear region model was proposed to optimize the energy density of laser annealing and to make predictions about polysilicon TFT technology, since TFTs performances versus grain size plots can be obtained.
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Anomalous turn-on voltage degradation during hot-carrier stress in polycrystalline silicon thin-film transistors

TL;DR: In this paper, the authors showed that hot-carrier stress in laser annealed polycrystalline silicon thin-film transistors provokes an anomalous turn-on voltage variation.
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Study of leakage current in n-channel and p-channel polycrystalline silicon thin-film transistors by conduction and low frequency noise measurements

TL;DR: In this paper, the off-state current in polycrystalline silicon thin-film transistors (polysilicon TFTs) is investigated systematically by conduction measurements at various temperatures and low-frequency noise measurements at room temperature.
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Contacts of titanium nitride to n- and p-type gallium nitride films

TL;DR: In this article, the electrical properties of TiN x contacts to n-and p-type GaN films, deposited by reactive magnetron sputtering at room temperature, are investigated. And it is shown that the ohmic behavior of the contacts is associated with the presence of a high density of interface states and not to the low Schottky barrier.