G
Gregor van Baars
Researcher at Philips
Publications - 6
Citations - 304
Gregor van Baars is an academic researcher from Philips. The author has contributed to research in topics: Iterative learning control & Particle detector. The author has an hindex of 4, co-authored 6 publications receiving 284 citations. Previous affiliations of Gregor van Baars include ASML Holding.
Papers
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Journal ArticleDOI
Multivariable feedback control design for high-precision wafer stage motion
TL;DR: In this article, a practically feasible procedure to design MIMO feedback controllers for electromechanical positioning devices, using H ∞ /μ techniques, is presented, where weighting filters are proposed to straightforwardly and effectively impose performance and uncertainty specifications.
Proceedings ArticleDOI
First performance results of the ASML alpha demo tool
Hans Meiling,Henk Meijer,Vadim Yevgenyevich Banine,Roel Moors,Regier Groeneveld,Harm Jan Voorma,Uwe Mickan,Bas Wolschrijn,Bas Mertens,Gregor van Baars,Peter Kürz,Noreen Harned +11 more
TL;DR: The ASML EUV alpha demo tool is operational, the tool performance is described, that vacuum is achieved in a few hours, and it is demonstrated that the optics contamination strategy mitigates degradation of the optics.
Patent
Method of adaptive interactive learning control and a lithographic manufacturing process and apparatus employing such a method
TL;DR: In this article, an adaptive filter for the learned feed-forward loop is designed, which varies according to the momentary frequency content of the error signal and allows to discriminate between areas of deterministic and stochastic error.
Proceedings ArticleDOI
Iterative learning control for variable setpoints, applied to a motion system
TL;DR: In this paper, a time-frequency adaptive iterative learning control (ILC) was proposed for motion systems that execute the same kind of repetitive tasks, and the proposed algorithm converges faster than standard ILC.
Patent
Measurement of the position of a radiation beam spot in lithography
Felix Godfried Peter Peeters,Jozef Petrus Henricus Benschop,Michael Jozefa Mathijs Renkens,Gregor van Baars,Jeroen Dekkers +4 more
TL;DR: In this paper, a radiation spot measurement system for a lithographic apparatus, the system having a target onto which a radiation system of the lithographic equipment may project spots of radiation for a measurement process, the target having a measurement target.