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Haoran Li

Researcher at University of California, Santa Barbara

Publications -  66
Citations -  1282

Haoran Li is an academic researcher from University of California, Santa Barbara. The author has contributed to research in topics: Gallium nitride & High-electron-mobility transistor. The author has an hindex of 15, co-authored 63 publications receiving 849 citations.

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Recent progress in metal-organic chemical vapor deposition of $\left( 000\bar{1} \right)$ N-polar group-III nitrides

TL;DR: In this article, the progress in metal-organic chemical vapor deposition of high quality N-polar (Al, Ga, In)N films on sapphire, silicon carbide and silicon substrates is reviewed with focus on key process components such as utilization of vicinal substrates, conditions ensuring a high surface mobility of species participating in the growth process, and low impurity incorporation.
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Demonstration of Constant 8 W/mm Power Density at 10, 30, and 94 GHz in State-of-the-Art Millimeter-Wave N-Polar GaN MISHEMTs

TL;DR: In this paper, the performance of N-polar GaN-based metal-insulator-semiconductor high-electron-mobility transistors at 30 and 94 GHz was investigated.
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N-Polar GaN Cap MISHEMT With Record Power Density Exceeding 6.5 W/mm at 94 GHz

TL;DR: In this paper, a novel N-Polar GaN cap (MIS) high electron mobility transistor demonstrating record 6.7-W/mm power density with an associated power-added efficiency of 14.4% at 94 GHz is presented.
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N-Polar GaN HEMTs Exhibiting Record Breakdown Voltage Over 2000 V and Low Dynamic On-Resistance

TL;DR: In this paper, Nitrogen polar (N-Polar) GaN high-electron-mobility transistors targeting high-voltage switching applications were fabricated on epi-layers grown by metal-organic chemical vapor deposition on sapphire substrates.
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W-Band Power Performance of SiN-Passivated N-Polar GaN Deep Recess HEMTs

TL;DR: In this article, a 40nm-thick ex-situ silicon nitride passivation layer was added to nitrogen-polar gallium nitride (GNT) transistors to improve the dispersion control.