I. Streiter

TL;DR: A range of mesoporous xerogel low-k dielectric films were prepared and characterised using complementary techniques: Laser-generated surface acoustic waves, ellipsometric porosimetry, Rutherford backscattering and nanoindentation as mentioned in this paper.

TL;DR: In this article, the density/porosity and Young's modulus values of a range of nanoporous silica aerogel films via dispersion of laser-generated, wideband, surface acoustic waves were measured.

TL;DR: In this article, the thickness and optical constants of xerogel films with low dielectric constants were derived from variable-angle spectroscopic ellipsometry measurements, and the as-prepared films were further treated by hexamethyldisilazane to achieve the hydrophobization of the pore surfaces.

TL;DR: Variable angle spectroscopic ellipsometry and ellipsometric porosimetry have been used to study the effect of treatment with hexamethyldisilazane (HMDS) on the porosity of silica xerogel films and chemical modification of the surface with HMDS was found to reduce the Porosity by ~15%.

TL;DR: In this article, the influence of the deposition of PECVD SiO 2 cap and sputtered and MOCVD TiN barrier layers on the electrical properties of low k xerogel films was examined.