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Jean-Marc Halbout

Researcher at IBM

Publications -  71
Citations -  1482

Jean-Marc Halbout is an academic researcher from IBM. The author has contributed to research in topics: Picosecond & Silicon. The author has an hindex of 21, co-authored 71 publications receiving 1452 citations.

Papers
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Journal ArticleDOI

Generation of subpicosecond electrical pulses on coplanar transmission lines

TL;DR: In this paper, photoconductively shorting a charged coplanar transmission line with 80 fs laser pulses was shown to yield electrical pulses shorter than 0.6 ps, after propagating 8 mm on the line.
Patent

Thin interface pellicle for dense arrays of electrical interconnects

TL;DR: In this article, a thin interface pellicle probe for making temporary or permanent interconnections to pads or bumps on a semiconductor device was proposed, where each contact has independent movement over a limited distance and of a limited rotation.
Journal ArticleDOI

Capacitance free generation and detection of subpicosecond electrical pulses on coplanar transmission lines

TL;DR: Ketchen et al. as discussed by the authors showed that to first order, the sliding-contact generation site has no capacitance, and this conclusion was further supported by a double sliding contact experiment where, to first-order, neither the generation nor the detection site has any capacitance.
Journal ArticleDOI

Broad-band microwave measurements with transient radiation from optoelectronically pulsed antennas

TL;DR: In this article, a broadband microwave measurement technique based on picosecond transient radiation from optoelectronically pulsed antennas is described, performed with exponentially tapered coplanar stripline antennas which are integrated with the photoconductive devices used for ultrafast pulse generation and sampling.
Journal ArticleDOI

Noninvasive picosecond ultrasonic detection of ultrathin interfacial layers: CFx at the Al/Si interface

TL;DR: In this article, a picosecond ultrasonics technique has been used to detect interfacial fluorocarbon (CFx) layers as thin as 0.5 nm between aluminum and silicon.