scispace - formally typeset
J

Jixia Dai

Researcher at Rutgers University

Publications -  15
Citations -  544

Jixia Dai is an academic researcher from Rutgers University. The author has contributed to research in topics: Topological insulator & Topological order. The author has an hindex of 11, co-authored 15 publications receiving 472 citations. Previous affiliations of Jixia Dai include University of Colorado Boulder.

Papers
More filters
Journal ArticleDOI

Record Surface State Mobility and Quantum Hall Effect in Topological Insulator Thin Films via Interface Engineering.

TL;DR: This scheme has led to the first observation of the quantum Hall effect in Bi2Se3, and introduces a quantum generation of Bi2 Se3 films with an order of magnitude enhanced mobilities than before.
Journal ArticleDOI

Toward the Intrinsic Limit of the Topological Insulator Bi 2 Se 3

TL;DR: It is established that the defect concentrations in Bi_{2}Se_{3} are far above the thermodynamic limit, and that the growth kinetics dominate the observed defect concentrations.
Journal ArticleDOI

Microscopic evidence for strong periodic lattice distortion in two-dimensional charge-density wave systems

TL;DR: In this article, the authors performed scanning tunneling microscopy experiments on canonical TMD-CDW systems and found dominant lattice contributions instead of the electronic modulation expected from Peierls transitions, in contrast to the CDW states.
Journal ArticleDOI

Local Density of States Study of a Spin-Orbit-Coupling Induced Mott Insulator Sr 2 IrO 4

TL;DR: In this paper, the authors present scanning tunneling microscopy and spectroscopy experiments on the novel Mott insulator and find that it is likely a Mott rather than a Slater insulator.