K
K. Moore
Researcher at Freescale Semiconductor
Publications - 2
Citations - 84
K. Moore is an academic researcher from Freescale Semiconductor. The author has contributed to research in topics: Atomic layer epitaxy & Amorphous solid. The author has an hindex of 2, co-authored 2 publications receiving 81 citations.
Papers
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Proceedings ArticleDOI
Challenges for the integration of metal gate electrodes
James K. Schaeffer,C. Capasso,L. R. C. Fonseca,S. Samavedam,David C. Gilmer,Yong Liang,S. Kalpat,B. Adetutu,Hsing-Huang Tseng,Y. Shiho,Alexander A. Demkov,Rama I. Hegde,W.J. Taylor,Rich Gregory,J. Jiang,E. Luckowski,M. Raymond,K. Moore,Dina H. Triyoso,D. Roan,B. E. White,Philip J. Tobin +21 more
TL;DR: In this article, the integration challenges for metal gate electrodes including the presence of Fermi level pinning and the impact of interface chemistry on the effective metal work function are discussed.
Journal ArticleDOI
Thermal stability, microstructure, and electrical properties of atomic layer deposited Hf6Ta2O17 gate dielectrics
TL;DR: In this paper, thermal stability, microstructure, and electrical properties of thin Hf6Ta2O17 high-k gate dielectrics were investigated using X-ray diffraction and transmission electron microscopy.