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Kenji Saitoh

Researcher at Canon Inc.

Publications -  96
Citations -  1454

Kenji Saitoh is an academic researcher from Canon Inc.. The author has contributed to research in topics: Diffraction & Diffraction grating. The author has an hindex of 19, co-authored 95 publications receiving 1454 citations.

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Patent

Wireless communication apparatus and method

TL;DR: In this article, a wireless communication apparatus and a method for making discrete functional elements perform a cooperative work without various limitations caused by a wired configuration is presented, where a plurality of fine functional elements 3 each having a communication unit for data transmission and reception by using radio waves or light and one or more unit other than the communication unit, and a base station 4 for controlling and collectively managing the fine functional element through communications with the fine elements.
Patent

Wavelength compensator in a helium ambience

TL;DR: A wavelength compensator as mentioned in this paper is a reference vacuum tube having closed ends, where a laser beam is reflected by the other end backwardly, and a light receiving device for receiving the interference beam which bears information related to a change in wavelength of the laser beam.
Patent

Device for detecting positional relationship between two objects

TL;DR: In this paper, the position of the first light upon the first detecting portion is changeable with a change in the positional relationship between the first and second objects in a predetermined direction.
Patent

Position detection method and apparatus

TL;DR: In this paper, a position detecting method for detecting the position of a substrate by use of a grating pattern provided on the substrate includes irradiating the grating patterns with first and second radiation beams having different wavelengths to produce first-and second diffraction beams of different wavelengths.
Patent

Measuring method and apparatus for meausring the positional relationship of first and second gratings

TL;DR: In this article, a method and apparatus for measuring a relative positional deviation between a first pattern and a second pattern, printed on an article such as a semiconductor wafer at different moments, was presented.