Systems and methods for implementing array cameras configured to perform super- resolution processing to generate higher resolution super-resolved images using a plurality of captured images and lens stack arrays that can be utilized in array cameras are disclosed. Lens stack arrays in accordance with many embodiments of the invention include lens elements formed on substrates separated by spacers, where the lens elements, substrates and spacers are configured to form a plurality of optical channels, at least one aperture located within each optical channel, at least one spectral filter located within each optical channel, where each spectral filter is configured to pass a specific spectral band of light, and light blocking materials located within the lens stack array to optically isolate the optical channels.

Capturing and processing of images using monolithic camera array with heterogeneous imagers

Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.

Principles of Lithography

A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Lithographic apparatus, and device manufacturing method

The present invention provides methods and devices for treating the annulus of an intervertebral disc. The methods and devices can employ an expandable treatment device which is deployed at least partially in the subannular space. Fixation devices and methods are also disclosed, which help to secure the treatment device in place.

Method and apparatus for the treatment of the intervertebral disc annulus

The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.

Step and repeat imprint lithography processes

A mask manufacturing method suitable for an exposure method wherein a mask on which a desired pattern and a supplementary pattern with formations smaller than those of the desired pattern are arrayed is illuminated, and the light which passed through the mask onto a member to be exposed is projected via a projection optical system, said method comprising a selecting step for selecting one of the following three supplementary patterns, a first supplementary pattern wherein said supplementary pattern is disposed at a position where a line extending in the vertical direction as to the pitch direction from a certain desired pattern hole of said desired pattern, and a line connecting the supplementary pattern hole closest to said certain desired pattern hole in the vertical direction with said certain desired pattern hole, intersect at an angle of 0°, a second supplementary pattern wherein said angle is 0° or more but less than 45°, and a third supplementary pattern wherein said supplementary pattern supplementary pattern is disposed at a position where said is disposed at a position where said angle is 45°.

Mask and manufacturing method thereof and exposure method

An encoder includes an electrically conductive reference scale having surface steps formed at predetermined positions; an electrically conductive probe having a tip disposed opposed to the reference scale; wherein the reference scale and the probe are relatively movable in a direction different from the opposing direction of the tip of the probe and the reference scale; a portion for applying an electrical voltage to between the reference scale and the probe; a portion for detecting a change in a tunnel current between the reference scale and the probe, to between which the electric voltage is applied by the voltage applying portion at the time of the relative movement between the scale and the probe, the detecting portion detecting the change in the tunnel current when the probe passes a position opposed to a surface step of the reference scale; and portion for detecting the amount of the relative movement between the scale and probe, on the basis of the detection by the change detecting portion.

Encoder for controlling measurements in the range of a few angstroms

Provided is an image pickup optical system capable of performing focusing in a wide region without a large increase in tilt angle in the case where an image of an object is picked up from a low angle. The image pickup optical system includes a first optical system and a second optical system, for enlarging an image formed by the first optical system and forming the enlarged image. A principal plane of the first optical system is tilted relative to an image plane of the second optical system.

Image pickup optical system

IDEALSmile is introduced as a new exposure technique that realizes k 1 =0.29. In this paper IDEALSmile is targeted for contact hole patterns (C/H). The results validate that it is possible to simultaneously expose not only k 1 =0.32 half-pitch dense and isolated C/H patterns, but also different pitches using Canon FPA-5000ES3 (KrF, NA=0.73), which is impossible by conventional methods. Since these results are obtained using a binary mask and modified illumination with single exposure, there are no concerns with regards to a decrease in throughput and an increase in cost of ownership. However, one of the issues in fabricating C/H patterns is the mask error enhancement factor (MEEF). Our simulation has shown that IDEALSmile exhibits good MEEF. Although there are questions regarding optical microlithography for critical C/H patterning, the IDEALSmile exposure method has the potential to be the solution. By attaining k 1 =0.32, printing 100nm C/H patterns can be achieved with a single exposure using KrF lithography, such as the Canon FPA-5000ES4 (KrF, NA=0.80). Furthermore, the IDEALSmile technique using ArF or F2 lithography will be effective for C/H patterns below the 100nm node. There is no doubt that optical microlithography will continue for some time.

New resolution enhancement method realizing the limit of single mask exposure

An image processing system or image processing method for performing image sensing by an image sensing unit having plural image sensing devices then outputting plural image data, wireless-transmitting the plural image data, and generating a combined image based on the wireless-transmitted plural image data.

Image processing system, method and program for image sensing using plural image sensing devices, wirelessly transmitting plural image data and processing the image data

Kenji Saitoh

Papers

Mask and manufacturing method thereof and exposure method

Encoder for controlling measurements in the range of a few angstroms

Image pickup optical system

New resolution enhancement method realizing the limit of single mask exposure

Image processing system, method and program for image sensing using plural image sensing devices, wirelessly transmitting plural image data and processing the image data