Systems and methods for implementing array cameras configured to perform super- resolution processing to generate higher resolution super-resolved images using a plurality of captured images and lens stack arrays that can be utilized in array cameras are disclosed. Lens stack arrays in accordance with many embodiments of the invention include lens elements formed on substrates separated by spacers, where the lens elements, substrates and spacers are configured to form a plurality of optical channels, at least one aperture located within each optical channel, at least one spectral filter located within each optical channel, where each spectral filter is configured to pass a specific spectral band of light, and light blocking materials located within the lens stack array to optically isolate the optical channels.

Capturing and processing of images using monolithic camera array with heterogeneous imagers

Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.

Principles of Lithography

A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Lithographic apparatus, and device manufacturing method

The present invention provides methods and devices for treating the annulus of an intervertebral disc. The methods and devices can employ an expandable treatment device which is deployed at least partially in the subannular space. Fixation devices and methods are also disclosed, which help to secure the treatment device in place.

Method and apparatus for the treatment of the intervertebral disc annulus

The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.

Step and repeat imprint lithography processes

PROBLEM TO BE SOLVED: To provide an imaging optical system that ensures easy focusing and can provide an image of high optical performance over a wide area by minimizing a rake angle when imaging an object at a low angle. SOLUTION: The imaging optical system includes a first optical system composed of a coaxial system, and a second optical system composed of a coaxial system and magnifies an image formed by the first optical system to form an image again, wherein the principal plane of the first optical system is tilted with respect to the image plane of the second optical system. COPYRIGHT: (C)2008,JPO&INPIT

Imaging optical system

Verfahren und Vorrichtung zum optischen Detektieren der Lage eines Gegenstandes

PURPOSE:To obtain position deviation between grating patterns, by using interference light of two grating patterns on the same object. CONSTITUTION:The luminous flux of a laser light source 3 is divided into two directions according to the polarization directions, by a polarization beam split surface 20a in a prism 20, and guided to a wafer 1 by mirror surfaces 20b, 20c. Two diffraction gratings 2a, 2b are so arranged on the upper surface of the wafer 1 that the grating directions are in parallel to each other. The diffracted lights from the wafer 1 are combined and made to interfere by a Glan-Thompson prism 10, and detected by photo detectors 12, 14 according to the polarization directions. From the outputs of the photo detectors 12, 14, phase difference is measured by a phase meter 13, and the position deviation between the diffraction gratings 2a, 2b are obtained. In particular, a means for sensing mutual position relation between the wafer 1 and an irradiation optical system of laser light is installed.

Measuring equipment of position deviation

To realize a wireless imaging apparatus having excellent sensitivity to an environmental change, a wireless imaging device has an imaging unit with a function of imaging a subject and a communication unit with a wireless communication function The imaging unit has, at least, an optical lens, an aperture 2 to limit incident light from the optical lens, an optical sensor 4 to convert the incident light passed through the aperture 2 into an electric signal, and an antenna for wireless communication, integrally formed with the aperture

Radio photographic device and its control method

PURPOSE: A mask is provided to perform a high resolution exposure process on a pattern that has a hole of a fine diameter and at least one contact hole without replacing a mask. CONSTITUTION: A mask(320) is prepared in which a predetermined pattern and a sub pattern having a smaller dimension than the predetermined pattern are disposed. When an imaginary lattice with a lattice point positioned in the center of the predetermined pattern is assumed, the center of the sub pattern doesn't coincide with the lattice point of the imaginary lattice.

Kenji Saitoh

Papers

Imaging optical system

Verfahren und Vorrichtung zum optischen Detektieren der Lage eines Gegenstandes

Measuring equipment of position deviation

Radio photographic device and its control method

Mask, fabricating method thereof, exposure method and method for fabricating device to perform high resolution exposure