Systems and methods for implementing array cameras configured to perform super- resolution processing to generate higher resolution super-resolved images using a plurality of captured images and lens stack arrays that can be utilized in array cameras are disclosed. Lens stack arrays in accordance with many embodiments of the invention include lens elements formed on substrates separated by spacers, where the lens elements, substrates and spacers are configured to form a plurality of optical channels, at least one aperture located within each optical channel, at least one spectral filter located within each optical channel, where each spectral filter is configured to pass a specific spectral band of light, and light blocking materials located within the lens stack array to optically isolate the optical channels.

Capturing and processing of images using monolithic camera array with heterogeneous imagers

Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.

Principles of Lithography

A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Lithographic apparatus, and device manufacturing method

The present invention provides methods and devices for treating the annulus of an intervertebral disc. The methods and devices can employ an expandable treatment device which is deployed at least partially in the subannular space. Fixation devices and methods are also disclosed, which help to secure the treatment device in place.

Method and apparatus for the treatment of the intervertebral disc annulus

The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.

Step and repeat imprint lithography processes

A device usable with a first object and a second object at least one of which is provided with a diffraction grating, for detecting the position of the second object relative to the first object, is disclosed. The device includes a light source for projecting a position detecting beam upon the first object; a beam detecting portion for receiving the position detecting beam after it is directed from the first object and being incident on the second object, the beam detecting portion receiving the position detecting beam to detect the position of the second object relative to the first object; wherein at least one diffraction grating is disposed in the path of the position detecting beam to be received by the beam detecting portion, which diffraction grating is effective to diffract the position detecting beam at least twice and wherein the beam detecting portion is disposed at a site effective not to receive unwanted diffraction light produced from the or at least one diffraction grating.

Position detecting method and apparatus including Fraunhofer diffraction detector

At least one exemplary embodiment is directed to an illuminating apparatus, configured to uniformly illuminate a surface of an object, and includes a light-guiding member configured to guide light emitted from a source to a surface to be illuminated, and a reflecting member disposed between the light-guiding member and the surface to be illuminated. The reflecting member includes a pair of reflection surfaces disposed so as to face each other in a long side direction of the surface to be illuminated, and reflects light emitted from the light-guiding member in directions having directional components parallel to a short side direction of the surface to be illuminated toward the surface to be illuminated.

Illuminating apparatus and surface inspection system using illuminating apparatus

PROBLEM TO BE SOLVED: To provide a mask realizing exposure of a pattern having one hole or a plurality of holes having a fine hole diameter (for example, ≤0.15 μm) by high resolution, and to provide a manufacturing method therefor and an exposure method. SOLUTION: The mask manufacturing method suitable for an exposure method wherein a mask on which a desired pattern and a supplementary pattern having a smaller dimension than that of the desired pattern are arrayed is illuminated with light, and the light passed through the mask is projected onto a member to be exposed via a projection optical system. The manufacturing method includes a step of selecting one of the following three supplementary patterns, a first supplementary pattern disposed at a position where a line extending in the perpendicular direction to the pitch direction from a certain desired pattern of the desired pattern, and a line connecting the certain desired pattern to a supplementary pattern closest to the certain desired pattern in the perpendicular direction intersect at an angle of 0°, a second supplementary pattern disposed at a position where the angle is 0° or more but less than 45°, and a third supplementary pattern disposed at a position where the angle is 45°. COPYRIGHT: (C)2005,JPO&NCIPI

Mask and manufacturing method therefor, and exposure method

An exposure method and apparatus for exposing a resist with a pattern image of a mask having patterns being different with respect to contrast of image, wherein the position where an image of a pattern, of the patterns of the mask, having lower contrast of image is formed is exposed with an image of contrast higher than the lower contrast image, whereby contrast of exposure amount distribution related to the pattern of lower contrast is improved.

Exposure method and exposure apparatus

In 2002, Canon introduced a new method for contact-hole printing, using a binary mask and single exposure, entitled IDEALSmile (Innovative Double Effective source Aided Lithography with Single Mask Implemented Lithographic Enhancement)). IDEALSmile demonstrated its significant potential for k/sub 1/=0.3 lithography of contact hole patterns. Since then, additional fundamental experiments, such as through-pitch performance, and process applications, were performed to verify the potential effects of IDEALSmile. We have now developed a new type of IDEALSmile by rearranging the dummy patterns and manipulating the diffracted light on the pupil plane. In this paper we will review the principle of IDEALSmile in detail and introduce the new IDEALSmile configuration.

Kenji Saitoh

Papers

Position detecting method and apparatus including Fraunhofer diffraction detector

Illuminating apparatus and surface inspection system using illuminating apparatus

Mask and manufacturing method therefor, and exposure method

Exposure method and exposure apparatus

An innovative method for contact hole printing with binary mask and single exposure