L
Lijuan Wang
Researcher at Chinese Academy of Sciences
Publications - 37
Citations - 277
Lijuan Wang is an academic researcher from Chinese Academy of Sciences. The author has contributed to research in topics: Quantum dot & Molecular beam epitaxy. The author has an hindex of 8, co-authored 37 publications receiving 243 citations.
Papers
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Journal ArticleDOI
Novel Dilute Bismide, Epitaxy, Physical Properties and Device Application
Lijuan Wang,Liyao Zhang,Li Yue,Dan Liang,Xiren Chen,Yaoyao Li,Pengfei Lu,Jun Shao,Shumin Wang +8 more
TL;DR: In this article, theoretical predictions of physical properties of binary and bismide alloys, epitaxial growth of thin films and nanostructures, surface, structural, electric, transport and optic properties of various binaries, and device applications are reviewed.
Journal ArticleDOI
Single InAs Quantum Dot Grown at the Junction of Branched Gold-Free GaAs Nanowire
Ying Yu,Mi-Feng Li,Ji-Fang He,Yu-Ming He,Yu-Jia Wei,Yu He,Guo-Wei Zha,Xiang-Jun Shang,Juan Wang,Lijuan Wang,Guowei Wang,Haiqiao Ni,Chao-Yang Lu,Zhichuan Niu +13 more
TL;DR: A new type of single InAs quantum dot embedded at the junction of gold-free branched GaAs/AlGaAs nanowire (NW) grown on silicon substrate is reported, which may open new ways for designing novel quantum optoelectronic devices.
Journal ArticleDOI
Single InAs quantum dot coupled to different “environments” in one wafer for quantum photonics
Ying Yu,Xiang-Jun Shang,Mi-Feng Li,Guo-Wei Zha,Xu Jianxing,Lijuan Wang,Guowei Wang,Haiqiao Ni,Xiuming Dou,Baoquan Sun,Zhichuan Niu +10 more
TL;DR: In this article, self assembled small InAs quantum dots (SQDs) were formed in various densities and environments using gradient InAs deposition on a non-rotating GaAs substrate.
Journal ArticleDOI
Molecular beam epitaxy growth and optical properties of high bismuth content GaSb1-xBix thin films
Li Yue,Xiren Chen,Yanchao Zhang,Yanchao Zhang,Fan Zhang,Lijuan Wang,Jun Shao,Shumin Wang,Shumin Wang +8 more
TL;DR: In this article, the growth of GaSb 1-x Bi x thin films was studied by varying V/III ratio, growth temperatures and Bi flux using molecular beam epitaxy, and the highest average Bi content up to 11% with locally up to 13% was achieved.
Journal ArticleDOI
Molecular beam epitaxy growth of AlAs1−x Bi x
Chang Wang,Chang Wang,Lijuan Wang,Xiaoyan Wu,Yanchao Zhang,Yanchao Zhang,Hao Liang,Li Yue,Zhenpu Zhang,Zhenpu Zhang,Xin Ou,Shumin Wang,Shumin Wang,Shumin Wang +13 more
TL;DR: In this paper, a 400 nm-thick AlAsBi layer with 3-10.5% Bi incorporation was successfully grown by molecular beam epitaxy using Rutherford backscattering spectroscopy.