L
Lucia Calcagno
Researcher at University of Catania
Publications - 170
Citations - 3187
Lucia Calcagno is an academic researcher from University of Catania. The author has contributed to research in topics: Ion & Irradiation. The author has an hindex of 28, co-authored 164 publications receiving 2972 citations. Previous affiliations of Lucia Calcagno include Istituto Nazionale di Fisica Nucleare.
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Structural modification of polymer films by ion irradiation
TL;DR: The atomic and electronic structure of polymer films undergoes deep modifications during high energy (keV-MeV) ion irradiation, from molecular solid to amorphous material as discussed by the authors, and the concentration of trigonal carbon (sp 2 ) in the polymer changes with ion fluence (10 11 −10 14 ions cm 2 ) and stabilizes to a value of 20% independently on the initial chemical structure of the irradiated sample.
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Structural and electrical characterisation of Titanium and Nickel silicide contacts on Silicon carbide
TL;DR: In this article, the interfacial reaction and phase formation as a function of the annealing temperature (600-1000°C) and time were investigated on both titanium and nickel thin films evaporated on n-type 6H-SiC (0001) substrate.
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Highly reproducible ideal SiC Schottky rectifiers: effects of surface preparation and thermal annealing on the Ni/6H-SiC barrier height
Fabrizio Roccaforte,F. La Via,Vito Raineri,Paolo Musumeci,Lucia Calcagno,Guglielmo G. Condorelli +5 more
TL;DR: In this article, the effects of surface preparation and thermal annealing on the Ni/6H-SiC Schottky barrier height were studied by monitoring the forward I-V characteristics of Schotty diodes, and the ideality factor n and the barrier height ΦB were found strongly dependent on the impurity species present at the metal/SiC interface.
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4H-SiC epitaxial layer growth by trichlorosilane (TCS)
F. La Via,Gaetano Izzo,Marco Mauceri,Giuseppe Pistone,Guglielmo G. Condorelli,L. Perdicaro,Giuseppe Abbondanza,Lucia Calcagno,Gaetano Foti,Danilo Crippa +9 more
TL;DR: Schottky diodes have been manufactured on the epitaxial layer of 4H-SiC epilayers with trichlorosilane instead of silane as the silicon precursor.
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Schottky--ohmic transition in nickel silicide/SiC-4H system: is it really a solved problem?
F. La Via,Fabrizio Roccaforte,Vito Raineri,Marco Mauceri,Alfonso Ruggiero,Paolo Musumeci,Lucia Calcagno,A. Castaldini,Anna Cavallini +8 more
TL;DR: The transition from Schottky to ohmic contact in the nickel silicide/SiC system during annealing from 600 to 950 °C was investigated by measuring the electrical properties of the contact and by analyzing the microstructure of the silicide and SiC interface as mentioned in this paper.