L
Lucyna Grządziel
Researcher at Silesian University of Technology
Publications - 26
Citations - 405
Lucyna Grządziel is an academic researcher from Silesian University of Technology. The author has contributed to research in topics: Thin film & Work function. The author has an hindex of 12, co-authored 26 publications receiving 356 citations.
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Influence of substrate doping on the surface chemistry and morphology of Copper Phthalocyanine ultra thin films on Si (111) substrates
TL;DR: In this paper, the thickness of the native SiO 2 over-layer is shown to be 0.67 and 1.15 nm for the CuPc film on the doped Si(111) substrate, respectively.
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Detection of intra-band gap defects states in spin-coated sol-gel SnOx nanolayers by photoelectron spectroscopies
Lucyna Grządziel,Maciej Krzywiecki,Maciej Krzywiecki,Anna Szwajca,Adnan Sarfraz,Georgi Genchev,Andreas Erbe,Andreas Erbe +7 more
TL;DR: In this paper, the presence of gap defects states for ultra-thin tin dioxide (SnOx; 1 < x < 2) is crucial for efficient manufacturing of multipurpose electronic devices based on transparent conducting oxides.
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Comparative study of surface morphology of copper phthalocyanine ultra thin films deposited on Si (111) native and RCA-cleaned substrates
TL;DR: In this article, a comparative study of substrate doping influence on surface morphology of 16-nm CuPc ultra-thin layers deposited on RCA-cleaned Si (111)/SiO2 substrates was carried out by X-ray photoelectron spectroscopy and atomic force microscopy.
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X-ray Photoelectron Spectroscopy characterization of native and RCA-treated Si (111) substrates and their influence on surface chemistry of copper phthalocyanine thin films
TL;DR: In this paper, X-ray photoemission spectroscopy and angle-resolved Xray Photoemission Spectroscopy (ARPSS) was used to investigate the carbon contamination of n-and p-doped Si(111) substrates and ultra-thin 16-nm copper phthalocyanine (CuPc) layers.
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Energy level alignment at the Si(111)/RCA-SiO2/copper(II) phthalocyanine ultra-thin film interface
TL;DR: In this article, the existence of the polarization layer is attributed to disordered adsorption and continous molecular reorientation of the CuPc molecules during the interface formation process.