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Mandar M. Deshmukh

Researcher at Tata Institute of Fundamental Research

Publications -  106
Citations -  4051

Mandar M. Deshmukh is an academic researcher from Tata Institute of Fundamental Research. The author has contributed to research in topics: Graphene & Nanowire. The author has an hindex of 31, co-authored 96 publications receiving 3550 citations. Previous affiliations of Mandar M. Deshmukh include Harvard University & University of California, San Diego.

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Signatures of Molecular Magnetism in Single-Molecule Transport Spectroscopy

TL;DR: In this paper, single-molecule transistor measurements on devices incorporating magnetic molecules were performed to identify signatures of magnetic states and their associated magnetic anisotropy, and a comparison of the data to simulations also suggests that sequential electron tunneling may enhance the magnetic relaxation of the magnetic molecule.
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Signatures of Molecular Magnetism in Single-Molecule Transport Spectroscopy

TL;DR: By studying the electron-tunneling spectrum as a function of magnetic field, it is able to identify signatures of magnetic states and their associated magnetic anisotropy and suggests that sequential electron tunneling may enhance the magnetic relaxation of the magnetic molecule.
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Probing thermal expansion of graphene and modal dispersion at low-temperature using graphene nanoelectromechanical systems resonators

TL;DR: It is found that thermal expansion of graphene is negative for all temperatures between 300 and 30 K, and with a lowering of temperature, the positively dispersing electromechanical modes evolve into negatively dispersing ones.
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Schottky barrier heights for Au and Pd contacts to MoS2

TL;DR: In this paper, the Schottky barrier heights for Au and Pd contacts to MoS2 were obtained by analysing low temperature transistor characteristics and contact resistance data obtained using the transfer length method.
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Nanofabrication using a stencil mask

TL;DR: In this paper, the authors describe a technique to fabricate nanostructures by the evaporation of metal through a stencil mask etched in a suspended silicon nitride membrane.