More than one-fifth of US electricity is used to power artificial lighting. Light-emitting diodes based on group III/nitride semiconductors are bringing about a revolution in energy-efficient lighting.

Prospects for LED lighting

Gallium nitride (GaN) and its allied binaries InN and AIN as well as their ternary compounds have gained an unprecedented attention due to their wide-ranging applications encompassing green, blue, violet, and ultraviolet (UV) emitters and detectors (in photon ranges inaccessible by other semiconductors) and high-power amplifiers. However, even the best of the three binaries, GaN, contains many structural and point defects caused to a large extent by lattice and stacking mismatch with substrates. These defects notably affect the electrical and optical properties of the host material and can seriously degrade the performance and reliability of devices made based on these nitride semiconductors. Even though GaN broke the long-standing paradigm that high density of dislocations precludes acceptable device performance, point defects have taken the center stage as they exacerbate efforts to increase the efficiency of emitters, increase laser operation lifetime, and lead to anomalies in electronic devices. The p...

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Luminescence properties of defects in GaN

Light-emitting diodes (LEDs), which convert electricity to light, are widely used in modern society—for example, in lighting, flat-panel displays, medical devices and many other situations. Generally, the efficiency of LEDs is limited by nonradiative recombination (whereby charge carriers recombine without releasing photons) and light trapping1–3. In planar LEDs, such as organic LEDs, around 70 to 80 per cent of the light generated from the emitters is trapped in the device4,5, leaving considerable opportunity for improvements in efficiency. Many methods, including the use of diffraction gratings, low-index grids and buckling patterns, have been used to extract the light trapped in LEDs6–9. However, these methods usually involve complicated fabrication processes and can distort the light-output spectrum and directionality6,7. Here we demonstrate efficient and high-brightness electroluminescence from solution-processed perovskites that spontaneously form submicrometre-scale structures, which can efficiently extract light from the device and retain wavelength- and viewing-angle-independent electroluminescence. These perovskites are formed simply by introducing amino-acid additives into the perovskite precursor solutions. Moreover, the additives can effectively passivate perovskite surface defects and reduce nonradiative recombination. Perovskite LEDs with a peak external quantum efficiency of 20.7 per cent (at a current density of 18 milliamperes per square centimetre) and an energy-conversion efficiency of 12 per cent (at a high current density of 100 milliamperes per square centimetre) can be achieved—values that approach those of the best-performing organic LEDs. The formation of submicrometre-scale structure in perovskite light-emitting diodes can raise their external quantum efficiency beyond 20%, suggesting the possibility of both high efficiency and high brightness.

Perovskite light-emitting diodes based on spontaneously formed submicrometre-scale structures

The III-nitrides include the semiconductors AlN, GaN and InN, which have band gaps spanning the entire UV and visible ranges. Thin films of III-nitrides are used to make UV, violet, blue and green light-emitting diodes and lasers, as well as solar cells, high-electron mobility transistors (HEMTs) and other devices. However, the film growth process gives rise to unusually high strain and high defect densities, which can affect the device performance. X-ray diffraction is a popular, non-destructive technique used to characterize films and device structures, allowing improvements in device efficiencies to be made. It provides information on crystalline lattice parameters (from which strain and composition are determined), misorientation (from which defect types and densities may be deduced), crystallite size and microstrain, wafer bowing, residual stress, alloy ordering, phase separation (if present) along with film thicknesses and superlattice (quantum well) thicknesses, compositions and non-uniformities. These topics are reviewed, along with the basic principles of x-ray diffraction of thin films and areas of special current interest, such as analysis of non-polar, semipolar and cubic III-nitrides. A summary of useful values needed in calculations, including elastic constants and lattice parameters, is also given. Such topics are also likely to be relevant to other highly lattice-mismatched wurtzite-structure materials such as heteroepitaxial ZnO and ZnSe.

https://iopscience.iop.org/article/10.1088/0034-4885/72/3/036502/pdf

X-ray diffraction of III-nitrides

Light-emitting diodes with emission wavelengths less than 400 nm have been developed using the AlInGaN material system. For devices operating at shorter wavelengths, alloy compositions with a greater aluminium content are required. The material properties of these materials lie on the border between conventional semiconductors and insulators, which adds a degree of complexity to the development of efficient light-emitting devices. A number of technical developments have enabled the fabrication of LEDs based on group three nitrides (III-nitrides) that emit in the UV part of the spectrum, providing useful tools for a wealth of applications in optoelectronic systems.

Ultraviolet light-emitting diodes based on group three nitrides

Compact solid-state lamps based on light-emitting diodes (LEDs) are of current technological interest as an alternative to conventional light bulbs The brightest LEDs available so far emit red light and exhibit higher luminous efficiency than fluorescent lamps If this luminous efficiency could be transferred to white LEDs, power consumption would be dramatically reduced, with great economic and ecological consequences But the luminous efficiency of existing white LEDs is still very low, owing to the presence of electrostatic fields within the active layers These fields are generated by the spontaneous and piezoelectric polarization along the [0001] axis of hexagonal group-III nitrides--the commonly used materials for light generation Unfortunately, as this crystallographic orientation corresponds to the natural growth direction of these materials deposited on currently available substrates Here we demonstrate that the epitaxial growth of GaN/(Al,Ga)N on tetragonal LiAlO2 in a non-polar direction allows the fabrication of structures free of electrostatic fields, resulting in an improved quantum efficiency We expect that this approach will pave the way towards highly efficient white LEDs

Nitride semiconductors free of electrostatic fields for efficient white light-emitting diodes

GaAs nanowires (NWs) grown by molecular-beam epitaxy may contain segments of both the zincblende (ZB) and wurtzite (WZ) phases. Depending on the growth conditions, we find that optical emission of such NWs occurs either predominantly above or below the band gap energy of ZB GaAs (${E}_{g}^{\mathrm{ZB}}$). This result is consistent with the assumption that the band gap energy of wurtzite GaAs (${E}_{g}^{\mathrm{WZ}}$) is larger than ${E}_{g}^{\mathrm{ZB}}$ and that GaAs NWs with alternating ZB and WZ segments along the wire axis establish a type II band alignment, where electrons captured within the ZB segments recombine with holes of the neighboring WZ segments. Thus, the corresponding transition energy depends on the degree of confinement of the electrons, and transition energies exceeding ${E}_{g}^{\mathrm{ZB}}$ are possible for very thin ZB segments. At low temperatures, the incorporation of carbon acceptors plays a major role in determining the spectral profile as these can effectively bind holes in the ZB segments. From cathodoluminescence measurements of single GaAs NWs performed at room temperature, we deduce a lower bound of 55 meV for the difference ${E}_{g}^{\mathrm{WZ}}\ensuremath{-}{E}_{g}^{\mathrm{ZB}}$.

Luminescence of GaAs nanowires consisting of wurtzite and zinc-blende segments

Efficient infrared light emitters integrated on the mature Si technology platform could lead to on-chip optical interconnects as deemed necessary for future generations of ultrafast processors as well as to nanoanalytical functionality. Toward this goal, we demonstrate the use of GaAs-based nanowires as building blocks for the emission of light with micrometer wavelength that are monolithically integrated on Si substrates. Free-standing (In,Ga)As/GaAs coaxial multishell nanowires were grown catalyst-free on Si(111) by molecular beam epitaxy. The emission properties of single radial quantum wells were studied by cathodoluminescence spectroscopy and correlated with the growth kinetics. Controlling the surface diffusivity of In adatoms along the NW side-walls, we improved the spatial homogeneity of the chemical composition along the nanowire axis and thus obtained a narrow emission spectrum. Finally, we fabricated a light-emitting diode consisting of approximately 10(5) nanowires contacted in parallel through the Si substrate. Room-temperature electroluminescence at 985 nm was demonstrated, proving the great potential of this technology.

Coaxial multishell (In,Ga)As/GaAs nanowires for near-infrared emission on Si substrates.

https://www.materialstoday.com/download/51085/

Formation of high-quality quasi-free-standing bilayer graphene on SiC(0 0 0 1) by oxygen intercalation upon annealing in air

Of the approaches currently under investigation for the fabrication of functional III–V semiconductor nanostructures, self-organized growth mechanisms and directed growth on patterned substrates have yielded quantum wires and dots with the best structural and electronic properties1. In patterned growth, high densities of structures are difficult to obtain; self-organization, on the other hand, can provide densely packed structures with good crystal quality, but generally offers limited control over nanostructure uniformity and spatial position. In the case of quantum dots, non-uniformity of size and shape is clearly undesirable, as the resulting structures will exhibit a broad range of electronic and optical properties, effectively smearing out the sought-for zero-dimensional behaviour of the dot ensemble. Here we demonstrate a method for improving size uniformity, while maintaining a high density of quantum dots, that combines elements of both self-organization and patterning. The photoluminescence spectrum of the resulting ordered arrays of quantum dots is dominated by a single sharp line, rather than the series of sharp lines that would indicate transitions in quantum dots of different sizes2,3,4,5,6,7.

Manfred Ramsteiner

Papers

Nitride semiconductors free of electrostatic fields for efficient white light-emitting diodes

Luminescence of GaAs nanowires consisting of wurtzite and zinc-blende segments

Coaxial multishell (In,Ga)As/GaAs nanowires for near-infrared emission on Si substrates.

Formation of high-quality quasi-free-standing bilayer graphene on SiC(0 0 0 1) by oxygen intercalation upon annealing in air

Uniform quantum-dot arrays formed by natural self-faceting on patterned substrates