M
Marco Polli
Researcher at KLA-Tencor
Publications - 18
Citations - 107
Marco Polli is an academic researcher from KLA-Tencor. The author has contributed to research in topics: Multiple patterning & Metrology. The author has an hindex of 6, co-authored 18 publications receiving 101 citations.
Papers
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Journal ArticleDOI
Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow
Hari Pathangi,Boon Teik Chan,Hareen Bayana,Nadia Vandenbroeck,Dieter Van den Heuvel,Lieve Van Look,Paulina Rincon-Delgadillo,Yi Cao,Jihoon Kim,Guanyang Lin,Doni Parnell,Kathleen Nafus,Ryota Harukawa,Ito Chikashi,Marco Polli,Lucia D'Urzo,Roel Gronheid,Paul F. Nealey +17 more
TL;DR: In this article, the authors identify the issues and the level of control needed to achieve a stable DSA defect performance and identify the root causes of the DSA-induced defects and their kinetics of annihilation.
Proceedings ArticleDOI
Double Patterning Overlay and CD budget for 32 nm technology node
Umberto Iessi,Sara Loi,Antonio Salerno,Pierluigi Rigolli,Elio De Chiara,Catia Turco,Roberto Colombo,Marco Polli,Antonio Mani +8 more
TL;DR: In this article, the overlay and CD budget applied to a double patterning technique for the definition of a 32nm technology node device, using an immersion scanner tool, was evaluated in order to define the requested tool performances in terms of overlay, CD control and metrology.
Proceedings ArticleDOI
Inspection challenges for triple patterning at sub-14 nm nodes with broadband plasma inspection platforms
Sandip Halder,Vincent Truffert,Dieter Van den Heuvel,Philippe Leray,Shaunee Cheng,Greg McIntyre,Kaushik Sah,Jim Brown,Paolo Parisi,Marco Polli +9 more
TL;DR: In order to control and predict yield for sub-14 nm nodes, it is shown that design information when integrated with inspection platforms can help predict design weak spots efficiently.
Proceedings ArticleDOI
Spectroscopic ellipsometry for lithography front-end level CD control: a complete analysis for production integration
David Herisson,DaniEle Neira,Cyril Fernand,Philippe Thony,Daniel Henry,Stephanie Kremer,Marco Polli,Marco Guevremont,Assim Elazami +8 more
TL;DR: In this article, a complete study of gate lithography level measurement on standard products has been conducted using scatterometry based on Spectroscopic Ellipsometry (SE) using KLA-Tencor SpectraCD SE system.
Proceedings ArticleDOI
Overlay Metrology for Double Patterning Processes
Philippe Leray,Shaunee Cheng,David Laidler,Daniel Kandel,Michael E. Adel,Berta Dinu,Marco Polli,Mauro Vasconi,Bartlomiej Salski +8 more
TL;DR: Different flavors of the standard overlay metrology technique (IBO) as well as the new technique (SCOL) are used to address the requirements of process compatibility, enhanced performance and large number of measurements for overlay control in double patterning processes.