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Masahiro Orita

Researcher at Hoya Corporation

Publications -  96
Citations -  8786

Masahiro Orita is an academic researcher from Hoya Corporation. The author has contributed to research in topics: Thin film & Pulsed laser deposition. The author has an hindex of 31, co-authored 95 publications receiving 8524 citations. Previous affiliations of Masahiro Orita include Universidad de Sonora.

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Heteroepitaxial growth of a wide-gap p-type semiconductor, LaCuOS

TL;DR: In this paper, a bilayer film composed of an extremely thin metallic copper layer and an amorphous LaCuOS layer at 1000 ˚C was used to grow a wide gap p-type semiconductor, which exhibited relatively intense ultraviolet emission associated with excitons at room temperature, confirming the high crystal quality of the films.
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Near-UV emitting diodes based on a transparent p-n junction composed of heteroepitaxially grown p-SrCu2O2 and n-Zno

TL;DR: In this paper, a near-UV emitting diode was fabricated by successive heteroepitaxial growth of In 2 O 3 :Sn(ITO), n-electrode, n-ZnO, and p-SrCu 2 O 2 (SCO) on an extremely flat surface of yttria-stabilized ZrO 2 single crystalline substrate using a pulsed-laser deposition technique.
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Preparation of transparent p-type (La1−xSrxO)CuS thin films by r.f. sputtering technique

TL;DR: In this paper, single phase thin films of a layered oxysulfide, (La 1− x Sr x O)CuS ( x = 0, and 0.03), were prepared by r.f. sputtering technique followed by a post-annealing treatment in an evacuated silica tube containing a small amount of (LaO) CuS powder.
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Electronic structure and transport properties in the transparent amorphous oxide semiconductor 2 CdO ⋅ GeO 2

TL;DR: In this paper, the density of states (DOS) of the conduction band of amorphous polycrystalline semiconductors was investigated using inverse-photo-electron spectroscopy and molecular orbital calculation.
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Growth mechanism for single-crystalline thin film of InGaO3(ZnO)5 by reactive solid-phase epitaxy

TL;DR: In this paper, the growth mechanism for a single-crystalline film of InGaO3(ZnO)5 (IGZO) on a (111)-oriented yttria-stabilized-zirconia substrate by reactive solid phase epitaxy was studied by high-resolution x-ray diffraction, transmission electron microscopy, and atomic force microscopy.