M
Mathias Rommel
Researcher at Fraunhofer Society
Publications - 129
Citations - 1333
Mathias Rommel is an academic researcher from Fraunhofer Society. The author has contributed to research in topics: Focused ion beam & Conductive atomic force microscopy. The author has an hindex of 15, co-authored 119 publications receiving 1071 citations. Previous affiliations of Mathias Rommel include University of Erlangen-Nuremberg.
Papers
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Journal ArticleDOI
Junction formation and current transport mechanisms in hybrid n-Si/PEDOT:PSS solar cells
Sara Jäckle,Matthias Mattiza,Martin Liebhaber,Gerald Brönstrup,Gerald Brönstrup,Mathias Rommel,Klaus Lips,Silke Christiansen,Silke Christiansen +8 more
TL;DR: The presented work clearly shows that PEDOT:PSS forms a hybrid heterojunction with n-Si behaving similar to a conventional pn-junction and not, like commonly assumed, a Schottky junction.
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Topic Review: Application of Raman Spectroscopy Characterization in Micro/Nano-Machining
Zongwei Xu,Zhongdu He,Ying Song,Xiu Fu,Mathias Rommel,Xichun Luo,Alexander Hartmaier,Junjie Zhang,Fengzhou Fang +8 more
TL;DR: The Tip-Enhanced Raman Spectroscopy (TERS) technique is helpful to dramatically enhance the Raman scattering signal at weak damages and it is considered as a promising research field.
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Tunneling atomic-force microscopy as a highly sensitive mapping tool for the characterization of film morphology in thin high-k dielectrics
V. Yanev,Mathias Rommel,Martin Lemberger,S. Petersen,B. Amon,Tobias Erlbacher,Anton J. Bauer,Heiner Ryssel,Albena Paskaleva,Wenke Weinreich,Christian Fachmann,Johannes Heitmann,Uwe Schroeder +12 more
TL;DR: In this article, tunneling atomic-force microscopy (TUNA) was used for the characterization of morphology in thin high-k dielectric films on a nanoscale.
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The influence of the measurement environment on the accuracy of the extraction of the physical parameters of solar cells
TL;DR: It is shown that the number of measurement points for the current-voltage characteristic can have an important effect on the accuracy of the parameters extracted, and the Marquardt-Levenberg algorithm using a least squares error criterion and a hybrid algorithm employing an area criterion outperform other choices of fitting algorithm.
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UV nanoimprint materials: Surface energies, residual layers, and imprint quality
TL;DR: In this paper, a systematic investigation of commercially available photocuring materials was conducted to provide an overview of the properties of these materials and their wetting behavior with respect to different substrate surfaces was characterized and surface tensions were determined from their contact angles against two specifically selected solid surfaces.