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Maurine Malak

Researcher at University of Paris

Publications -  35
Citations -  357

Maurine Malak is an academic researcher from University of Paris. The author has contributed to research in topics: Fabry–Pérot interferometer & Interferometry. The author has an hindex of 11, co-authored 35 publications receiving 334 citations. Previous affiliations of Maurine Malak include Ain Shams University & École Polytechnique Fédérale de Lausanne.

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Journal ArticleDOI

Free-Space Tunable and Drop Optical Filters Using Vertical Bragg Mirrors on Silicon

TL;DR: In this paper, vertical Bragg grating mirrors are realized by the anisotropic etching of Si using deep reactive ion etching (DRIE), thus producing multiple vertical interfaces between Si and air.
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Cylindrical Surfaces Enable Wavelength-Selective Extinction and Sub-0.2 nm Linewidth in 250 $\mu\hbox{m}$ -Gap Silicon Fabry–Pérot Cavities

TL;DR: In this article, two different designs of micromachined Fabry-Perot optical cavities are proposed to improve the quality factor (Q -factor) and increase the cavity length.
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Study of black silicon obtained by cryogenic plasma etching: approach to achieve the hot spot of a thermoelectric energy harvester

TL;DR: In this article, the authors simulate the optical reflectance of three-dimensional micro/nano silicon cones of different dimensions and under different electric field incident angles (źi).
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Micromachined Fabry–Perot resonator combining submillimeter cavity length and high quality factor

TL;DR: In this paper, the authors demonstrate an optical quality factor of nearly 9000 in a micromachined Fabry-Perot resonator based on free space propagation of light and direct coupling to optical fibers.

Study of black silicon obtained by cryogenic plasma etching: approach to achieve the hot spot of a thermoelectric energy

TL;DR: In this paper, the enhanced absorption properties of micro/nano structured silicon surface under incident electromagnetic illumination and its capacity to convert light into heat were studied. And the reflectance of the black silicon was measured to be approxi- mately 1 % in the optical wavelength range, by using an integrating sphere coupled to a calibrated spectrometer.