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Michael Schmid

Researcher at Vienna University of Technology

Publications -  738
Citations -  34058

Michael Schmid is an academic researcher from Vienna University of Technology. The author has contributed to research in topics: Scanning tunneling microscope & Karyotype. The author has an hindex of 88, co-authored 715 publications receiving 30874 citations. Previous affiliations of Michael Schmid include Ludwig Maximilian University of Munich & University of Zurich.

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Vacancy clusters at domain boundaries and band bending at the SrTiO 3 ( 110 ) surface

TL;DR: In this paper, two types of antiphase domain boundaries (APDBs) formed on each reconstruction were studied with scanning tunneling microscopy, x-ray photoemission spectroscopy, and density functional theory calculations.
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Scanning tunneling spectroscopy on clean and contaminated V(0 0 1)

TL;DR: In this paper, the authors reported a strong surface state 0.03 eV below the Fermi level for clean V(0,0,1), carbon-covered V( 0,0,1), and the oxygen-induced V(1,5,1) (1×5) reconstruction.
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Solving the cable problem between crystal sensor and electronics by use of a balanced bridge oscillator circuit

TL;DR: The balanced bridge oscillator circuit presented in this article perfectly compensates for the negative influence of the cable by two almost equal bridge branches; the first one contains the sensor crystal connected via the sensor cable, the second one contains an identical cable terminated by a capacity equal to the resonator's static capacity.
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Total sputter yield of LiF induced by hyperthermal ions measured by a quartz microbalance

TL;DR: In this article, the total sputter yield of LiF induced by singly charged hyperthermal He+, Ne+ and Ar+ ions with a kinetic energy of 5-500 eV is presented.
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A misfit structure in the Co/Pt(111) system studied by scanning tunnelling microscopy and embedded atom method calculations

TL;DR: In this paper, the structure observed upon annealing a Pt(1.1) sample with a 2 ML (monolayer, ML) thick film of Co does not consist of a rotated Co film but rather of a CoPt alloy film with hexagonal areas of fcc stacking, single and double stacking faults, delimited by misfit dislocations.