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Mukul Gupta

Researcher at Indian Department of Atomic Energy

Publications -  334
Citations -  3110

Mukul Gupta is an academic researcher from Indian Department of Atomic Energy. The author has contributed to research in topics: Thin film & Amorphous solid. The author has an hindex of 26, co-authored 278 publications receiving 2519 citations. Previous affiliations of Mukul Gupta include ETH Zurich & High Energy Materials Research Laboratory.

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Study of iron nitride thin films deposited by pulsed laser deposition

TL;DR: In this article, thin films of iron nitrides were deposited by pulsed laser deposition at different nitrogen pressures, both in the presence and absence of glow-discharge around the substrate.
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Nitrogen diffusion in amorphous silicon nitride isotope multilayers probed by neutron reflectometry.

TL;DR: In this paper, the authors used neutron reflectometry on isotope enriched Si{sub 3} {sup 14}N{sub 4}/Si{sub 2] {sup 15}N {sub 4] multilayers to determine nitrogen self-diffusivities ranging from 10{sup -24} to 10 {sup -21} m{sup 2}/s between 950 and 1250 deg.
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Thermal stability of nanometer range Ti/Ni multilayers

TL;DR: In this paper, the thermal stability of equidistant nanometer (nm) range Ti/Ni multilayer (ML) structures have been studied to investigate the interfacial microstructural changes upon thermal annealing.
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Self-diffusion of iron in amorphous iron nitride

TL;DR: In this article, the authors measured self-diffusion of iron in amorphous nitride using secondary-ion mass spectroscopy and showed strong structural relaxation effects on diffusion coefficient.