M
Mukul Gupta
Researcher at Indian Department of Atomic Energy
Publications - 334
Citations - 3110
Mukul Gupta is an academic researcher from Indian Department of Atomic Energy. The author has contributed to research in topics: Thin film & Amorphous solid. The author has an hindex of 26, co-authored 278 publications receiving 2519 citations. Previous affiliations of Mukul Gupta include ETH Zurich & High Energy Materials Research Laboratory.
Papers
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How to measure atomic diffusion processes in the sub-nanometer range
Harald Schmidt,Harald Schmidt,Mukul Gupta,Mukul Gupta,Thomas Gutberlet,Jochen Stahn,Michael Bruns +6 more
TL;DR: In this paper, the authors presented the method of neutron reflectometry on isotope multilayers for diffusivity determination in amorphous and nano-structured solids.
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Gradient doping – a case study with Ti-Fe2O3 towards an improved photoelectrochemical response
Anupam Srivastav,Anuradha Verma,Anamika Banerjee,Saif A. Khan,Mukul Gupta,Vibha R. Satsangi,Rohit Shrivastav,Sahab Dass +7 more
TL;DR: The photoelectrochemical studies revealed that the deposition of dopant layers with a low to high concentration towards the substrate exhibited a highly improved photoresponse (200 times) in comparison to the pristine sample and a two fold enhancement in compared to 2% Ti-doped Fe2O3.
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Effect of oxygen partial pressure on the behavior of dual ion beam sputtered ZnO thin films
Saurabh Kumar Pandey,Sushil Kumar Pandey,Uday P. Deshpande,Vishnu Awasthi,Ashish Kumar,Mukul Gupta,Shaibal Mukherjee +6 more
TL;DR: In this article, undoped ZnO thin films were grown on p-type Si substrates at different oxygen partial pressure by dual ion beam sputtering deposition system at a constant growth temperature of 400°C.
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Impact of Self-Trapped Excitons on Blue Photoluminescence in TiO2 Nanorods on Chemically Etched Si Pyramids
C. P. Saini,A. Barman,Debosmita Banerjee,O. Grynko,S. Prucnal,Mukul Gupta,D. M. Phase,Anil K. Sinha,D. Kanjilal,Wolfgang Skorupa,Aloke Kanjilal +10 more
TL;DR: In this article, temperature-dependent photoluminescence (PL) of titanium oxide (TiO2) shows an evolution of blue emission when exposed to 50 keV Ar+ ions.
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Study of magnetic iron nitride thin films deposited by high power impulse magnetron sputtering
TL;DR: In this article, phase formation, structural and magnetic properties of iron-nitride (Fe-N) thin films were studied using high power impulse magnetron sputtering (HiPIMS) and dc-MS techniques.