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Mukul Gupta

Researcher at Indian Department of Atomic Energy

Publications -  334
Citations -  3110

Mukul Gupta is an academic researcher from Indian Department of Atomic Energy. The author has contributed to research in topics: Thin film & Amorphous solid. The author has an hindex of 26, co-authored 278 publications receiving 2519 citations. Previous affiliations of Mukul Gupta include ETH Zurich & High Energy Materials Research Laboratory.

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Preparation and characterization of Fe4N thin film deposited by high power impulse magnetron sputtering

TL;DR: In this article, high power impulse magnetron sputtering (HiPIMS) was used for the first time to grow Fe4N films and it was found that substantial inter-diffusion takes place between the substrate-film interface when Ts=675 K.
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Fe and N diffusion in nitrogen-rich FeN measured using neutron reflectometry

TL;DR: In this article, the authors measured the self-diffusion of the isotope multilayers of [FeN/57FeN] and [Fe N/Fe15N] using magnetron sputtering and self diffusion of Fe and N was investigated.
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Phase formation and crystallization in Bi-Sr-Ca-Cu-O thick films

TL;DR: In this paper, the effect of heat treatment on phases formed at various stages of the film preparation is studied and it is shown that a thin layer at the top is highly oriented while the bulk of the 212 phase material beneath it consists of randomly oriented grains.
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Study of magnetic zigzag domain walls and magnetization reversal process in polycrystalline cobalt thin films: Effect of thickness and crystallographic texturing

TL;DR: In this paper, the effects of crystallographic texturing on the formation of magnetic zigzag domain walls (DWs) and magnetization reversal process in polycrystalline cobalt thin films of different thickness (10 to 91nm) deposited by magnetron sputtering technique were reported.
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Deposition of Fe/Nb multilayers and Fe/Nb/Fe trilayers using HIPIMS: XRR measurements for interface diffusion study

TL;DR: In this article, X-ray reflectivity (XRR) measured patterns revealed the high quality of the film structure with a low surface and interface roughness using high power impulse magnetron sputtering technique.