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O.P. Agnihotri

Researcher at Indian Institutes of Technology

Publications -  39
Citations -  859

O.P. Agnihotri is an academic researcher from Indian Institutes of Technology. The author has contributed to research in topics: Thin film & Silicon nitride. The author has an hindex of 17, co-authored 39 publications receiving 836 citations. Previous affiliations of O.P. Agnihotri include KAIST.

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The preparation, properties and applications of silicon nitride thin films deposited by plasma-enhanced chemical vapor deposition

TL;DR: In this article, the preparation and characterization of thin films of silicon nitride deposited by the technique of plasma-enhanced chemical vapor deposition is reviewed and the applications of silicon-nitride thin films in integrated circuit technology are also reviewed.
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Structural, optical and photoluminescence properties of electron beam evaporated CdSe1−xTex films

TL;DR: In this paper, the effect of composition and substrate temperature on transmission spectra was studied for CdSe0.8Te0.2 and CdTe 0.2 films.
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Structural and optical properties of sprayed CuInS2 films

TL;DR: In this article, thin films were prepared by spray pyrolysis and characterized by X-ray diffraction, transmission and scanning electron microscopy, optical transmission and electrical measurements.
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Preparation and intrinsic absorption in the band edge in chemically sprayed In2O3 layers

TL;DR: In this article, a process for producing In2O3 layers from indium is described, which involves the thermal decomposition of InCl3 in an oxidizing atmosphere in a suitable furnace.
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Fluorine-doped SnO2 films for solar cell application

TL;DR: In this paper, high conductive transparent thin films of fluorine-doped SnO2 (SnO2:F) were prepared using spray pyrolysis and the optical data were interpreted to give a direct band gap of 4.27 eV and an indirect band gap 2.73 eV.