Philip C. D. Hobbs

TL;DR: Several easily implemented devices for doing ultrasensitive optical measurements with noisy lasers are presented, all-electronic noise cancellation circuits that largely eliminate excess laser intensity noise as a source of measurement error and are widely applicable.

TL;DR: In this article, a method for performing high resolution optical imaging in the near infrared of internal features of semiconductor wafers uses an optical device made from a material having a high index of refraction and held in very close proximity to the wafer.

TL;DR: In this article, the authors proposed a method for controlling a line dimension in a photolithographic process utilizing a wafer coated with a chemically amplified photoresist, which comprises the steps of measuring at at least two times, and from at least three angles, evolving signals comprising intensities of light diffracted from a portion of an exposed patterned area on the waver.

TL;DR: Measurements showing overall quantum efficiencies of 6% are presented, thus demonstrating that the previously very low overall Quantum efficiencies reported for antenna-coupled tunnel junction devices are due to poor electromagnetic coupling and poor choices of antenna metal, not to any inherent limitations of the technology.

TL;DR: In this article, an integrated scanning force microprobe and optical microscopy metrology system is disclosed, that measures the depth and width of a trench in a sample, while the probe remains fixed while the sample is moved relative to the probe, providing output signals indicating the vertical and transverse relationship of the probe to the sample.