R
Richard Lossy
Researcher at Ferdinand-Braun-Institut
Publications - 35
Citations - 517
Richard Lossy is an academic researcher from Ferdinand-Braun-Institut. The author has contributed to research in topics: High-electron-mobility transistor & Gallium nitride. The author has an hindex of 11, co-authored 35 publications receiving 466 citations.
Papers
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Journal ArticleDOI
High gain ultraviolet photodetectors based on AlGaN/GaN heterostructures for optical switching
Martin Martens,Jessica Schlegel,Patrick Vogt,Frank Brunner,Richard Lossy,Joachim Würfl,Markus Weyers,Michael Kneissl +7 more
TL;DR: In this paper, the optoelectronic properties of Al0.25Ga0.75N/GaN-based ultraviolet (UV) photodetectors for the application as a high current, high gain optical switch were reported.
Journal ArticleDOI
Reliability issues of GaN based high voltage power devices
Joachim Wuerfl,Eldad Bahat-Treidel,Frank Brunner,E. Cho,Oliver Hilt,Ponky Ivo,Arne Knauer,P. Kurpas,Richard Lossy,M. Schulz,S. Singwald,Markus Weyers,Rimma Zhytnytska +12 more
TL;DR: Those degradation mechanisms that are especially due to the specific material combinations used in GaN based high voltage device technology such as epitaxial layer design, chip metallization, passivation schemes and general device topology and layout are discussed.
Journal ArticleDOI
Proton and Heavy Ion Irradiation Effects on AlGaN/GaN HFET Devices
G. Sonia,Frank Brunner,A. Denker,Richard Lossy,M. Mai,J. Opitz-Coutureau,G. Pensl,Eberhard Richter,J. Schmidt,Ute Zeimer,L. Wang,Markus Weyers,Joachim Würfl,Günther Tränkle +13 more
TL;DR: Operation of AlGaN/GaN HFETs in space was simulated by irradiation with protons and heavy ions at 68 MeV and 2MeV and fluences up to 1013 cm-2 and the results of the material characterization correlate with the device results.
Journal ArticleDOI
Comparative study of AlGaN/GaN HEMTs robustness versus buffer design variations by applying Electroluminescence and electrical measurements
Ponky Ivo,Arkadiusz Glowacki,Eldad Bahat-Treidel,Richard Lossy,Joachim Würfl,Christian Boit,Günther Tränkle +6 more
TL;DR: It has been shown that EL at forward and reverse bias conditions can be used as an indicator of potential device degradation and devices comprising an AlGaN back-barrier design demonstrated superior robustness.
Proceedings ArticleDOI
Influence of GaN cap on robustness of AlGaN/GaN HEMTs
Ponky Ivo,Arkadiusz Glowacki,Reza Pazirandeh,Eldad Bahat-Treidel,Richard Lossy,Joachim Würfl,Christian Boit,Günther Tränkle +7 more
TL;DR: In this paper, DC-step-stress tests of GaN HEMTs have been performed on wafers with and without GaN-cap, and it has been found that wafer with GaN cap show much higher critical voltages as compared to non-capped epitaxial designs.