A high-performance novel photodetector is demonstrated, which consists of graphene and CH3 NH3 PbI3 perovskite layers. The resulting hybrid photodetector exhibits a dramatically enhanced photo responsivity (180 A/W) and effective quantum efficiency (5× 10(4) %) over a broad bandwidth within the UV and visible ranges.

High-Performance Perovskite–Graphene Hybrid Photodetector

Recent advances in ultraviolet photodetectors

III-nitride ultraviolet emitters : technology and applications

Solid state UV emitters have many advantages over conventional UV sources. The (Al,In,Ga)N material system is best suited to produce LEDs and laser diodes from 400 nm down to 210 nm—due to its large and tuneable direct band gap, n- and p-doping capability up to the largest bandgap material AlN and a growth and fabrication technology compatible with the current visible InGaN-based LED production. However AlGaN based UV-emitters still suffer from numerous challenges compared to their visible counterparts that become most obvious by consideration of their light output power, operation voltage and long term stability. Most of these challenges are related to the large bandgap of the materials. However, the development since the first realization of UV electroluminescence in the 1970s shows that an improvement in understanding and technology allows the performance of UV emitters to be pushed far beyond the current state. One example is the very recent realization of edge emitting laser diodes emitting in the UVC at 271.8 nm and in the UVB spectral range at 298 nm. This roadmap summarizes the current state of the art for the most important aspects of UV emitters, their challenges and provides an outlook for future developments.

https://iopscience.iop.org/article/10.1088/1361-6463/aba64c/pdf

The 2020 UV emitter roadmap

Hexagonal boron nitride (h-BN), an isomorph of graphene, has attracted great attention owing to its potential applications as an ultra-flat substrate or gate dielectric layer in novel graphene-based devices. Besides, h-BN appears to be a promising material for deep ultraviolet (DUV) optoelectronic applications because of its extraordinary physical properties, such as wide band gap and high absorption coefficient. In this work, two-dimensional h-BN with controllable layers was synthesized on Cu foils by ion beam sputtering deposition, and DUV photodetectors were fabricated from the transferred h-BN layers on SiO2/Si substrates. The h-BN layers synthesized at the higher substrate temperature possess a lower density of domain boundaries and higher crystalline quality, and the photodetectors based on a 3 nm h-BN layer exhibited high performance with an on/off ratio of >103 under DUV light illumination at 212 nm and a cutoff wavelength at around 225 nm. This work demonstrates that two-dimensional h-BN layers are promising for the construction of high-performance solar-blind photodetectors.

High-performance deep ultraviolet photodetectors based on few-layer hexagonal boron nitride

We report on the optoelectronic properties of Al0.25Ga0.75N/GaN-based ultraviolet (UV) photodetectors for the application as a high current, high gain optical switch. Due to an internal gain mechanism combined with the high conductivity of the two-dimensional electron gas at the heterostructure interface, photocurrents in the milliampere-range were obtained with UV illumination. By employing a mesa structure design with meander geometry very low dark currents below 50 nA up to a bias voltage of 100 V were achieved. Optical switching with an on/off-current-ratio of five orders of magnitude was demonstrated. The response time was determined to be 6 ms and persistent photoconductivity was observed. The photodetector is visible-blind with a cut-off wavelength of 365 nm according to the band gap energy of the GaN absorption layer. A high responsivity with a maximum of 70 A/mW at 312 nm and 100 V bias voltage was demonstrated.

High gain ultraviolet photodetectors based on AlGaN/GaN heterostructures for optical switching

Structural and optical properties of semipolar (112¯2) AlGaN grown on (101¯0) sapphire by metal–organic vapor phase epitaxy

High aluminium content and high growth rates of AlGaN in a close-coupled showerhead MOVPE reactor

Excitonic emission in heteroepitaxially grown aluminum nitride (AlN) with reduced defect density due to the epitaxial lateral overgrowth (ELO) of patterned AlN/sapphire templates has been investigated by photoluminescence spectroscopy and compared to AlN/sapphire and homoepitaxially grown AlN. The ELO sample exhibits small linewidths of the free exciton and two different bound exciton emission bands. The free exciton emission energy is shifted by 58.5 meV with respect to unstrained homoepitaxially grown AlN attributed to compressive strain. A donor bound exciton D0X with an exciton localization energy of 13.0–13.5 meV is dominating in the photoluminescence spectra of ELO AlN/sapphire. This D0X does not show strong phonon replica and is dominant at elevated temperatures in ELO AlN/sapphire. The optical quality of heteroepitaxial AlN is significantly improved using the ELO technique and therefore suitable for high efficiency ultraviolet light emitters.

Excitonic recombination in epitaxial lateral overgrown AlN on sapphire

Recent progress in the development of ultraviolet laser diodes will be reviewed. The effect of the heterostructure design on the gain characteristics as well as epitaxial growth challenges for AlGaN-based UV lasers will be discussed.

Jessica Schlegel

Papers

High gain ultraviolet photodetectors based on AlGaN/GaN heterostructures for optical switching

Structural and optical properties of semipolar (112¯2) AlGaN grown on (101¯0) sapphire by metal–organic vapor phase epitaxy

High aluminium content and high growth rates of AlGaN in a close-coupled showerhead MOVPE reactor

Excitonic recombination in epitaxial lateral overgrown AlN on sapphire

AlGaN-based ultraviolet lasers — Applications and materials challenges