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Sa Hoang Huynh

Researcher at National Chiao Tung University

Publications -  21
Citations -  151

Sa Hoang Huynh is an academic researcher from National Chiao Tung University. The author has contributed to research in topics: Chemical vapor deposition & Epitaxy. The author has an hindex of 6, co-authored 20 publications receiving 92 citations.

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Effects of In-Situ Plasma-Enhanced Atomic Layer Deposition Treatment on the Performance of HfO 2 /In 0.53 Ga 0.47 As Metal–Oxide–Semiconductor Field-Effect Transistors

TL;DR: In-situ plasma-enhanced atomic layer deposition (PEALD) technique was employed for device passivation to realize a high-performance inversion-mode HfO2/In0.53Ga0.47As MOSFET as discussed by the authors.
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In 0.53 Ga 0.47 As FinFET and GAA-FET With Remote-Plasma Treatment

TL;DR: In this paper, a remote NH3/N2 plasma treatment after gate oxide deposition for improving the electrical characteristics and the reliability of In0.53Ga0.47As FinFETs was presented.
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Screw-Dislocation-Driven Growth Mode in Two Dimensional GaSe on GaAs(001) Substrates Grown by Molecular Beam Epitaxy.

TL;DR: Understanding of molecular beam epitaxy growth of 2D materials on three-dimensional substrates is provided and paves the way to realize future electronic and optoelectronic heterogeneous integrated technology as well as second harmonic generation applications.
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Substrate-induced strain in 2D layered GaSe materials grown by molecular beam epitaxy.

TL;DR: The results in this study provide an important understanding of the MBE-growth process of 2D-GaSe on 2D/3D hybrid-heterostructures and pave the way in strain engineering and optical manipulation of2D layered GaSe materials for novel optoelectronic integrated technologies.
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Impact of interfacial misfit dislocation growth mode on highly lattice-mismatched InxGa1-xSb epilayer grown on GaAs substrate by metalorganic chemical vapor deposition

TL;DR: In this article, the influence of growth parameters, such as growth temperature, indium vapor composition, and V/III ratio, on the film properties was investigated, and it was found that the growth temperature has the strongest effect on the surface morphology and the crystal quality of the InxGa1-xSb epilayer.