S
Sijie Chen
Researcher at Peking University
Publications - 4
Citations - 224
Sijie Chen is an academic researcher from Peking University. The author has contributed to research in topics: Memristor & Neuromorphic engineering. The author has an hindex of 4, co-authored 4 publications receiving 167 citations.
Papers
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Journal ArticleDOI
Reconfigurable Nonvolatile Logic Operations in Resistance Switching Crossbar Array for Large-Scale Circuits.
Peng Huang,Jinfeng Kang,Yudi Zhao,Sijie Chen,Runze Han,Zheng Zhou,Zhe Chen,Wenjia Ma,Li Mu,Lifeng Liu,Xiaoyan Liu +10 more
TL;DR: Resistance switching devices have potential to offer computing and memory function and Resistance states stored in devices located in arbitrary positions of RS array can be performed various nonvolatile logic operations.
Journal ArticleDOI
Compact Model of HfO X -Based Electronic Synaptic Devices for Neuromorphic Computing
Peng Huang,Dongbin Zhu,Sijie Chen,Zheng Zhou,Zhe Chen,Bin Gao,Lifeng Liu,Xiaoyan Liu,Jinfeng Kang +8 more
TL;DR: A compact model that can capture the synaptic futures of HfOx-based resistive switching device is developed and can accurately describe the multilevel conductance transition behaviors during RESET process for depression learning as well as the binary stochastic transition behavior during SET process for potentiation learning.
Journal ArticleDOI
Self-Selection RRAM Cell With Sub- $\mu \text{A}$ Switching Current and Robust Reliability Fabricated by High- $K$ /Metal Gate CMOS Compatible Technology
Peng Huang,Sijie Chen,Yudi Zhao,Bing Chen,Bin Gao,Lifeng Liu,Yong Chen,Ziying Zhang,Weihai Bu,Hanming Wu,Xiaoyan Liu,Jinfeng Kang +11 more
TL;DR: A high-K/metal gate (HKMG)-stack (TiN/Al-doped-HfO x /SiO2/Si)-based bipolar resistive random access memory (RRAM) cell is proposed and fabricated by 28/20-nm HKMG CMOS compatible technology as mentioned in this paper.
Proceedings ArticleDOI
Self-selection RRAM cell with Sub-μA switching current and robust reliability fabricated by high-K/metal gate CMOS compatible technology
TL;DR: In this paper, a high-K/metal gate (HKMG) stack (TiN/Al-doped-HfO X /SiO 2 /Si) based bipolar RRAM cell is proposed and fabricated by 28/20nm HKMG CMOS compatible technology.