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Simon Brown

Researcher at MacDiarmid Institute for Advanced Materials and Nanotechnology

Publications -  184
Citations -  6063

Simon Brown is an academic researcher from MacDiarmid Institute for Advanced Materials and Nanotechnology. The author has contributed to research in topics: Cluster (physics) & Neuromorphic engineering. The author has an hindex of 29, co-authored 182 publications receiving 5521 citations. Previous affiliations of Simon Brown include CGG & University of British Columbia.

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Engineering Multiple Topological Phases in Nanoscale Van der Waals Heterostructures: Realisation of $\alpha$-Antimonene

TL;DR: In this article, it is shown that it is possible to construct topologically interesting Van der Waals structures with multiple topological phases in a single nanoscale island, such as antimonene and bismuthene.
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Long-range temporal correlations in scale-free neuromorphic networks.

TL;DR: Numerical simulations are used to show that percolating networks of nanoparticles exhibit structural properties that are reminiscent of biological neuronal networks, and experimentally that stimulation of percolated networks by an external voltage stimulus produces temporal dynamics that are self-similar, follow power-law scaling, and exhibit long-range temporal correlations.
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Evolution of neck radius and relaxation of coalescing nanoparticles

TL;DR: In this paper, the radius of the neck region connecting the two nanoparticles is found to develop with characteristic power laws with $r\ensuremath{\sim{t}^{\text{a}}$ with
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First-principles and spectroscopic studies of Bi(110) films: Thickness-dependent Dirac modes and property oscillations

TL;DR: The electronic structure of Bi(110) thin films as a function of film thickness is investigated by first-principles calculations, angle-resolved photoemission spectroscopy, and scanning tunneling microscopy as mentioned in this paper.
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Reactive ion etch-induced effects on the near-band-edge luminescence in GaN

TL;DR: In this article, GaN grown on c-plane sapphire substrates has been reactive ion etched successfully in a SF6 plasma with an etch rate of 29 nm/min.