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Sitaram Dash

Researcher at Indira Gandhi Centre for Atomic Research

Publications -  166
Citations -  3685

Sitaram Dash is an academic researcher from Indira Gandhi Centre for Atomic Research. The author has contributed to research in topics: Thin film & Nanocrystalline material. The author has an hindex of 34, co-authored 164 publications receiving 3161 citations. Previous affiliations of Sitaram Dash include VIT University.

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Effect of Laser Shock Processing on the Microstructure of 304(L) Austenitic Stainless Steel

TL;DR: In this article, short duration laser pulses have been used to simulate the deformation defect structure that develops in 304(L) austenitic stainless steel during exposure to sodium-water reaction.
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Influence of Impinging Ion Energy on the Bonding and Mechanical Characteristics of DLC Films Deposited by Microwave ECR Plasma CVD

TL;DR: In this paper, the energy of the ions impinging on the substrate during deposition was varied by changing the rf self bias voltage developed on a substrate, and the results obtained from different characterization techniques are correlated and explained on the basis of existing growth models for DLC films.
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Single-step growth dynamics of core–shell GaN on Ga2O3 freestanding nanoprotruded microbelts

TL;DR: In this paper, a wurtzite GaN nanoprotruded microbelts with Ga2O3 core, with typical thickness 1-10μm, and length of few millimeters are synthesized by thermal annealing of Ga metal and subsequent reaction with ammonia at a low flow rate.
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Combustion chemical vapour deposition of Al2O3 films: Effect of temperature on structure, morphology and adhesion

TL;DR: In this article, a custom made premixed-diffusion type burner with an extra coaxial oxygen inlet close to the burner mouth enabled variation of deposition temperature from 600 to 900°C in steps of 100 (± 10)°C.
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The influence of nitrogen concentration on microstructure and ultra-low friction behaviour of Fe–N thin films

TL;DR: In this paper, the influence of nitrogen concentration on the microstructure, chemical and electronic properties of Fe-N thin films and their tribological behavior are studied, and the lowest friction and longest wear life is observed in the film with 12% nitrogen, which is due to the formation of e-Fe2N phase having high bond strength and chemically passive surface.