S
Sitaram Dash
Researcher at Indira Gandhi Centre for Atomic Research
Publications - 166
Citations - 3685
Sitaram Dash is an academic researcher from Indira Gandhi Centre for Atomic Research. The author has contributed to research in topics: Thin film & Nanocrystalline material. The author has an hindex of 34, co-authored 164 publications receiving 3161 citations. Previous affiliations of Sitaram Dash include VIT University.
Papers
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Journal ArticleDOI
Nanomechanical and optical properties of highly a-axis oriented AlN films
Feby Jose,R. Ramaseshan,S. Tripura Sundari,Sitaram Dash,A.K. Tyagi,Mangalampalli S. R. N. Kiran,Upadrasta Ramamurty +6 more
TL;DR: In this article, optical and nanomechanical properties of predominantly a-axis oriented AlN thin films were reported, which can be useful for piezoelectric films in bulk acoustic wave resonators.
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Significance of Al on the morphological and optical properties of Ti1−xAlxN thin films
Feby Jose,R. Ramaseshan,Sitaram Dash,S. Tripura Sundari,Deepti Jain,V. Ganesan,P. Chandramohan,M.P. Srinivasan,A.K. Tyagi,Baldev Raj +9 more
TL;DR: In this paper, the structure, surface morphology and optical properties were examined using Grazing Incidence X-ray Diffraction (GIXRD), Atomic Force Microscopy (AFM), Raman spectroscopy and spectroscopic ellipsometry, respectively.
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Imaging distribution of local stiffness over surfaces using atomic force acoustic microscopy
TL;DR: In this article, the authors report a systematic study to determine local elastic properties of surfaces using atomic force acoustic microscopy (AFAM), which is a combination of atomic force microscopy and acoustic waves.
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High-temperature phase transformation and low friction behaviour in highly disordered turbostratic graphite
TL;DR: In this article, the Raman spectra obtained from the locations of wear track, where ultra-low and high friction coefficient is measured, are used to analyze turbostratic graphite.
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Preferentially oriented electron beam deposited TiN thin films using focused jet of nitrogen gas
TL;DR: In this article, a modified electron beam evaporator was used to synthesize TiN thin films with (111) preferred orientation, and the hardness and modulus measured by nanoindentation technique was around 19.5 and 214 GPa, respectively.