S
Sozaraj Rasappa
Researcher at Trinity College, Dublin
Publications - 31
Citations - 640
Sozaraj Rasappa is an academic researcher from Trinity College, Dublin. The author has contributed to research in topics: Copolymer & Nanolithography. The author has an hindex of 14, co-authored 31 publications receiving 558 citations. Previous affiliations of Sozaraj Rasappa include Technical University of Denmark & Tyndall National Institute.
Papers
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Journal ArticleDOI
A facile route to synthesis of S-doped TiO2 nanoparticles for photocatalytic activity
Colm McManamon,Colm McManamon,John F. O'Connell,Paul Delaney,Sozaraj Rasappa,Sozaraj Rasappa,Justin D. Holmes,Justin D. Holmes,Michael A. Morris,Michael A. Morris +9 more
TL;DR: In this paper, a simple technique to synthesise porous TiO 2 nanoparticles with increased surface area through a scaffold template technique was proposed and validated by analysing the degradation of malachite green (MG).
Journal ArticleDOI
Plasma etch technologies for the development of ultra-small feature size transistor devices
Dipu Borah,Matthew T. Shaw,Sozaraj Rasappa,Richard A. Farrell,Colm T. O'Mahony,C. M. Faulkner,M. Bosea,P. Gleeson,Justin D. Holmes,Michael A. Morris +9 more
TL;DR: In this paper, the formation of ultra-small device structures from the directed self-assembly of block copolymers (BCPs) where nanopatterns are formed from the micro-phase separation of the system was discussed.
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Swift nanopattern formation of PS-b-PMMA and PS-b-PDMS block copolymer films using a microwave assisted technique.
Dipu Borah,Ramsankar Senthamaraikannan,Ramsankar Senthamaraikannan,Sozaraj Rasappa,Sozaraj Rasappa,B. Kosmala,B. Kosmala,Justin D. Holmes,Justin D. Holmes,Justin D. Holmes,Michael A. Morris,Michael A. Morris,Michael A. Morris +12 more
TL;DR: BCP self-assembly on two different systems, polystyrene-b-polymethylmethacrylate (PS-b -PMMA) and PS- b-PDMS, is reported here by microwave irradiation to achieve ordering in short times by investigating factors such as the anneal time and temperature, BCP film thickness, substrate surface type, etc.
Journal ArticleDOI
Orientation and alignment control of microphase-separated PS-b-PDMS substrate patterns via polymer brush chemistry.
Dipu Borah,Sozaraj Rasappa,Sozaraj Rasappa,Ramsankar Senthamaraikannan,Ramsankar Senthamaraikannan,B. Kosmala,B. Kosmala,Matthew T. Shaw,Justin D. Holmes,Justin D. Holmes,Justin D. Holmes,Michael A. Morris,Michael A. Morris,Michael A. Morris +13 more
TL;DR: In this paper, a cylinder-forming polystyrene-b-polydimethylsiloxane (polystyreneb-PDMS) system is applied to fabricate nanoscale features with a feature size of 14 nm.
Journal ArticleDOI
Study of the kinetics and mechanism of rapid self-assembly in block copolymer thin films during solvo-microwave annealing
Parvaneh Mokarian-Tabari,Parvaneh Mokarian-Tabari,Cian Cummins,Sozaraj Rasappa,Sozaraj Rasappa,Claudia Simao,Clivia M. Sotomayor Torres,Justin D. Holmes,Justin D. Holmes,Michael A. Morris,Michael A. Morris +10 more
TL;DR: Comparing the patterns formed on silicon, germanium and silicon on insulator (SOI) and also an in situ temperature measurement of silicon in the oven confirms the significance of the solvent over the role of substrate heating during "solvo-microwave" annealing.