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Sridhar Narasimhan

Researcher at Intel

Publications -  9
Citations -  735

Sridhar Narasimhan is an academic researcher from Intel. The author has contributed to research in topics: Thermoelectric cooling & Thermoelectric effect. The author has an hindex of 6, co-authored 9 publications receiving 682 citations.

Papers
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Journal ArticleDOI

On-chip cooling by superlattice-based thin-film thermoelectrics

TL;DR: This is the first demonstration of viable chip-scale refrigeration technology and has the potential to enable a wide range of currently thermally limited applications.
Patent

Soldering a die to a substrate

TL;DR: In this article, the male member is inserted into the female member to align the die relative to the substrate, and the male and the female members may have any configuration as long as one or more portions of the male members extend partially, or wholly, into a female member.
Patent

Microelectronic package and method for a compression-based mid-level interconnect

TL;DR: In this article, a microelectronic package includes first substrate (120 ) having first surface area ( 125 ) and second substrate ( 130 ) having second surface area( 135 ) and internal electrically conductive layers ( 233, 234 ) connected to each other with microvia ( 240 ).
Proceedings ArticleDOI

Feasibility study of using solid state refrigeration technologies for electronic cooling

TL;DR: In this paper, a thin-film thermoelectric cooler (TFTEC) is placed directly above the hotspot to provide localized cooling, and different packaging concepts including placing the TFTEC within the silicon die, between the silicon and the copper integral heat spreader, and embedded in the IHS are discussed.
Proceedings ArticleDOI

Thin film thermoelectric cooler thermal validation and product thermal performance estimation

TL;DR: In this article, the experimental and thermal modeling methodology that was used to characterize the thermal-electrical behavior of the prototypes was followed up with a validation of the prototype over a range of uniform and hot spot heating.