S
Stewart E. Rauch
Researcher at GlobalFoundries
Publications - 44
Citations - 1360
Stewart E. Rauch is an academic researcher from GlobalFoundries. The author has contributed to research in topics: Negative-bias temperature instability & Carrier lifetime. The author has an hindex of 16, co-authored 44 publications receiving 1215 citations. Previous affiliations of Stewart E. Rauch include IBM & State University of New York at New Paltz.
Papers
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Journal ArticleDOI
300-mm Monolithic Silicon Photonics Foundry Technology
Ken Giewont,Karen Nummy,Frederick A. Anderson,Javier Ayala,Tymon Barwicz,Yusheng Bian,Kevin Dezfulian,Douglas M. Gill,Thomas Houghton,Shuren Hu,Bo Peng,Michal Rakowski,Stewart E. Rauch,Jessie Rosenberg,Asli Sahin,Ian Stobert,Andy Stricker +16 more
TL;DR: In this paper, a state-of-the-art 300mm silicon photonics foundry technology has been developed by GLOBALFOUNDRIES for general availability, which takes advantage of advanced CMOS process technology and provides a manufacturing scale.
Journal ArticleDOI
Single-Event Upsets and Multiple-Bit Upsets on a 45 nm SOI SRAM
David F. Heidel,Paul W. Marshall,Jonathan A. Pellish,Kenneth P. Rodbell,Ken LaBel,J.R. Schwank,Stewart E. Rauch,Mark C. Hakey,Melanie D. Berg,C.M. Castaneda,Paul E. Dodd,M. Friendlich,A. Phan,Christina Seidleck,Marty R. Shaneyfelt,M.A. Xapsos +15 more
TL;DR: For the SOI SRAMs, a large MBU orientation effect is observed with most of the MBU events occurring along the same SRAM bit-line; allowing ECC circuits to correct most of theseMBU events.
Journal ArticleDOI
Review and Reexamination of Reliability Effects Related to NBTI-Induced Statistical Variations
TL;DR: In this article, a review of the understanding and models to date of the statistics and impacts of the NBTI-induced variation is presented, followed by a critical examination of the actual NBT I-induced distributions and the accuracy of the normal approximations that have been used to date.
Journal ArticleDOI
The energy-driven paradigm of NMOSFET hot-carrier effects
Stewart E. Rauch,G. La Rosa +1 more
TL;DR: In this paper, a new paradigm of NMOSFET hot-carrier behavior is proposed, in which the fundamental driving force is available energy, rather than peak lateral electric field, as it is in the lucky electron model (LEM).
Proceedings ArticleDOI
NBTI-channel hot carrier effects in PMOSFETs in advanced CMOS technologies
TL;DR: In this article, the reliability of a 0.35/spl mu/m p+ poly-gate pMOSFET CMOS technology under conductive channel hot carrier conditions is investigated.