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Sweta Chander

Researcher at Indian Institute of Technology (BHU) Varanasi

Publications -  60
Citations -  518

Sweta Chander is an academic researcher from Indian Institute of Technology (BHU) Varanasi. The author has contributed to research in topics: Tunnel field-effect transistor & Field-effect transistor. The author has an hindex of 9, co-authored 44 publications receiving 293 citations. Previous affiliations of Sweta Chander include Lovely Professional University & Indian Institutes of Technology.

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Device and Circuit-Level Assessment of GaSb/Si Heterojunction Vertical Tunnel-FET for Low-Power Applications

TL;DR: In this article, the performance of a vertically grown GaSb/Si tunnel field effect transistor (V-TFET) with a source pocket was investigated for the first time to enhance the carrier tunneling through the source-channel (Si) heterojunction.
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2-D Analytical Drain Current Model of Double-Gate Heterojunction TFETs With a SiO 2 /HfO 2 Stacked Gate-Oxide Structure

TL;DR: In this paper, a continuous 2D analytical drain current model of double-gate (DG) heterojunction tunnel field effect transistors (HJTFETs) with a SiO2/HfO2 stacked gate-oxide structures is presented.
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Heterojunction fully depleted SOI-TFET with oxide/source overlap

TL;DR: In this article, a hetero-junction fully depleted (FD) tunnel field effect transistor (TFET) nanostructure with oxide overlap on the Germanium-source region is proposed.
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Temperature analysis of Ge/Si heterojunction SOI-Tunnel FET

TL;DR: In this paper, the impact of temperature variation on the electrical characteristics such as tunneling width, subthreshold swing, threshold voltage, and I O N / I O F F ratio of Ge/Si heterojunction tunnel field effect transistor (TFET) for different drain voltages was presented.
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A Two-Dimensional Gate Threshold Voltage Model for a Heterojunction SOI-Tunnel FET With Oxide/Source Overlap

TL;DR: In this article, a two-dimensional analytical gate threshold voltage model for a heterojunction silicon-on-insulator tunnel field effect transistor structure with gate oxide overlap is developed, where the infinite series method with suitable boundary conditions is used to solve the 2D Poisson's equation for surface potential.