T
Tianchao Niu
Researcher at Chinese Academy of Sciences
Publications - 29
Citations - 1076
Tianchao Niu is an academic researcher from Chinese Academy of Sciences. The author has contributed to research in topics: Graphene & Graphene nanoribbons. The author has an hindex of 15, co-authored 21 publications receiving 925 citations. Previous affiliations of Tianchao Niu include Soochow University (Suzhou) & National University of Singapore.
Papers
More filters
Journal ArticleDOI
Growth intermediates for CVD graphene on Cu(111): carbon clusters and defective graphene.
TL;DR: In situ low-temperature scanning tunneling microscopy is used to reveal the graphene growth intermediates at different stages via thermal decomposition of methane on Cu(111) and it is clearly demonstrated that various carbon clusters, including carbon dimers, carbon rectangles, and 'zigzag' and 'armchair'-like carbon chains are the actual growth intermediate prior to the graphene formation.
Journal ArticleDOI
Critical crystal growth of graphene on dielectric substrates at low temperature for electronic devices.
TL;DR: A critical PECVD (c-PECVD) growth method, in which a H2 plasma is introduced during graphene growth, which observed efficient catalyst-free crystal growth of graphene directly on crystalline sapphire, highly oriented pyrolytic graphite (HOPG), and the amorphous surface of Si substrates.
Journal ArticleDOI
From two-dimensional materials to heterostructures
Tianchao Niu,Ang Li +1 more
TL;DR: Graphene, hexagonal boron nitride, molybdenum disulphide, and layered transition metal dichalcogenides (TMDCs) represent a class of two-dimensional (2D) atomic crystals with unique properties due to reduced dimensionality.
Journal ArticleDOI
Low temperature critical growth of high quality nitrogen doped graphene on dielectrics by plasma-enhanced chemical vapor deposition.
Dacheng Wei,Lan Peng,Li Menglin,Hongying Mao,Tianchao Niu,Cheng Han,Wei Chen,Andrew T. S. Wee +7 more
TL;DR: A critical factor for metal-free PECVD growth of NG is reported, which allows high quality NG crystals to be grown directly on dielectrics like SiO2/Si, Al2O3, h-BN, mica at 435 °C without a catalyst.
Journal ArticleDOI
How Graphene Islands Are Unidirectionally Aligned on the Ge(110) Surface
Dai Jiayun,Danxia Wang,Miao Zhang,Tianchao Niu,Ang Li,Mao Ye,Shan Qiao,Guqiao Ding,Xiaoming Xie,Yongqiang Wang,Paul K. Chu,Qinghong Yuan,Qinghong Yuan,Qinghong Yuan,Zengfeng Di,Xi Wang,Feng Ding,Boris I. Yakobson +17 more
TL;DR: It is reported that the necessary coalignment of the nucleating graphene islands on Ge(110) surface is caused by the presence of step-pattern, and it is shown that on the preannealed Ge (110) textureless surface the graphene islands appear nonpreferentially orientated, while on the Ge( 110) surfaces with natural step pattern, all graphene islands emerge coaligned.