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Tien-Yu Hsieh

Researcher at National Sun Yat-sen University

Publications -  48
Citations -  1143

Tien-Yu Hsieh is an academic researcher from National Sun Yat-sen University. The author has contributed to research in topics: Thin-film transistor & Threshold voltage. The author has an hindex of 18, co-authored 48 publications receiving 1030 citations.

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Behaviors of InGaZnO thin film transistor under illuminated positive gate-bias stress

TL;DR: In this paper, the impact of light illumination on the stability of indium-gallium- zinc oxide thin film transistors under positive gate-bias stress was investigated, and it was shown that illumination can excite the trapped charges and accelerate the charge detrapping process.
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Investigating the degradation behavior caused by charge trapping effect under DC and AC gate-bias stress for InGaZnO thin film transistor

TL;DR: In this article, the degradation mechanism of amorphous indium-gallium-zinc oxide thin-film transistors under gate-bias stress was investigated and it was shown that an extra electron trapping mechanism occurs during rising/falling time during the AC pulse period.
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Light-induced instability of an InGaZnO thin film transistor with and without SiOx passivation layer formed by plasma-enhanced-chemical-vapor-deposition

TL;DR: In this paper, the authors investigated the illuminated behaviors of InGaZnO thin film transistors with and without a SiOx passivation and found that more interface states were generated during SiOx layer deposition by plasma-enhanced-chemical-vapor-deposition.
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Impact of repeated uniaxial mechanical strain on p-type flexible polycrystalline thin film transistors

TL;DR: In this paper, the effect of repeated bending of flexible p-channel low-temperature polycrystalline-silicon thin-film transistors employing an ultra-lowtemperature process was investigated.
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Investigating the Drain-Bias-Induced Degradation Behavior Under Light Illumination for InGaZnO Thin-Film Transistors

TL;DR: In this article, the effect of gate/drain bias stress in InGaZnO thin-film transistors under light illumination and in a darkened environment was investigated and the degradation behavior was analyzed.