Showing papers by "Venkatesh Narayanamurti published in 2010"

Water Consumption of Energy Resource Extraction, Processing, and Conversion

Abstract: All responsibility for any errors or misjudgments rests solely with the authors.

Three-terminal field effect devices utilizing thin film vanadium oxide as the channel layer

Abstract: Electrostatic control of the metal-insulator transition (MIT) in an oxide semiconductor could potentially impact the emerging field of oxide electronics. Vanadium dioxide (VO2) is of particular interest due to the fact that the MIT happens in the vicinity of room temperature and it is considered to exhibit the Mott transition. We present a detailed account of our experimental investigation into three-terminal field effect transistor-like devices using thin film VO2 as the channel layer. The gate is separated from the channel through an insulating gate oxide layer, enabling true probing of the field effect with minimal or no interference from large leakage currents flowing directly from the electrode. The influence of the fabrication of multiple components of the device, including the gate oxide deposition, on the VO2 film characteristics is discussed. Further, we discuss the effect of the gate voltage on the device response, point out some of the unusual characteristics including temporal dependence. A re...

Measuring charge trap occupation and energy level in CdSe/ZnS quantum dots using a scanning tunneling microscope

Abstract: We use a scanning tunneling microscope to probe single-electron charging phenomena in individual CdSe/ZnS (core/shell) quantum dots (QDs) at room temperature. The QDs are deposited on top of a bare Au thin film and form a double-barrier tunnel junction (DBTJ) between the tip, QD, and substrate. Analysis of room-temperature hysteresis in the current-voltage $(IV)$ tunneling spectra, is consistent with trapped charge(s) presenting an additional potential barrier to tunneling, a measure of the Coulomb blockade. The paper describes the first direct electrical measurement of the trap-state energy on individual QDs. Manipulation of the charge occupation of the QD, verified by measuring the charging energy, $(61.4\ifmmode\pm\else\textpm\fi{}2.4)\text{ }\text{meV}$, and analysis of the DBTJ, show trap states $\ensuremath{\sim}1.09\text{ }\text{eV}$ below the QD conduction-band edge. In addition, the detrapping time, a measure of the tunneling barrier thickness, is determined to have an upper time limit of 250 ms. We hypothesize that the charge is trapped in a quantum-dot surface state.

Transistors formed from a single lithography step using information encoded in topography.

Abstract: This paper describes a strategy for the fabrication of functional electronic components (transistors, capacitors, resistors, conductors, and logic gates but not, at present, inductors) that combines a single layer of lithography with angle-dependent physical vapor deposition; this approach is named topographically encoded microlithography (abbreviated as TEMIL). This strategy extends the simple concept of 'shadow evaporation' to reduce the number and complexity of the steps required to produce isolated devices and arrays of devices, and eliminates the need for registration (the sequential stacking of patterns with correct alignment) entirely. The defining advantage of this strategy is that it extracts information from the 3D topography of features in photoresist, and combines this information with the 3D information from the angle-dependent deposition (the angle and orientation used for deposition from a collimated source of material), to create 'shadowed' and 'illuminated' regions on the underlying substrate. It also takes advantage of the ability of replica molding techniques to produce 3D topography in polymeric resists. A single layer of patterned resist can thus direct the fabrication of a nearly unlimited number of possible shapes, composed of layers of any materials that can be deposited by vapor deposition. The sequential deposition of various shapes (by changing orientation and material source) makes it possible to fabricate complex structures-including interconnected transistors-using a single layer of topography. The complexity of structures that can be fabricated using simple lithographic features distinguishes this procedure from other techniques based on shadow evaporation.

Scattering-Assisted Tunneling: Energy Dependence, Magnetic Field Dependence, and Use as an External Probe of Two-Dimensional Transport

Abstract: For more than three decades, research on tunneling through planar barriers has focused principally on processes that conserve momentum parallel to the barrier. Here we investigate transport in which scattering destroys lateral momentum conservation and greatly enhances the tunneling probability. We have measured its energy dependence using capacitance spectroscopy, and we show that for electrons confined in a quantum well, the scattering enhancement can be quenched in an applied magnetic field, enabling this mechanism to function as an external probe of the origin of the quantum Hall effect.

Measuring charge trap occupation and energy level in CdSe/ZnS quantum dots using a scanning tunneling microscope

Abstract: We use a scanning tunneling microscope to probe single-electron charging phenomena in individual CdSe/ZnS (core/shell) quantum dots (QDs) at room temperature. The QDs are deposited on top of a bare Au thin film and form a double-barrier tunnel junction (DBTJ) between the tip, QD, and substrate. Analysis of room-temperature hysteresis in the current-voltage (IV) tunneling spectra, is consistent with trapped charge(s) presenting an additional potential barrier to tunneling, a measure of the Coulomb blockade. The paper describes the first direct electrical measurement of the trap-state energy on individual QDs. Manipulation of the charge occupation of the QD, verified by measuring the charging energy, (61.4±2.4) meV, and analysis of the DBTJ, show trap states ~1.09 eV below the QD conduction-band edge. In addition, the detrapping time, a measure of the tunneling barrier thickness, is determined to have an upper time limit of 250 ms. We hypothesize that the charge is trapped in a quantum-dot surface state.

Three-terminal field effect devices utilizing thin film vanadium oxide as the channel layer

Abstract: Electrostatic control of the metal-insulator transition (MIT) in an oxide semiconductor could potentially impact the emerging field of oxide electronics. Vanadium dioxide is of particular interest due to the fact that the MIT happens in the vicinity of room temperature and it is considered to exhibit the Mott transition. We present a detailed account of our experimental investigation into three-terminal field effect transistor-like devices using thin film VO2 as the channel layer. The gate is separated from the channel through an insulating gate oxide layer, enabling true probing of the field effect with minimal or no interference from large leakage currents flowing directly from the electrode. The influence of the fabrication of multiple components of the device, including the gate oxide deposition, on the VO2 film characteristics is discussed. Further, we discuss the effect of the gate voltage on the device response, point out some of the unusual characteristics including temporal dependence. A reversible unipolar modulation of the channel resistance upon the gate voltage is demonstrated for the first time in optimally engineered devices. The results presented in this work are of relevance towards interpreting gate voltage response in such oxides as well as addressing challenges in advancing gate stack processing for oxide semiconductors.

Functional oxide nanostructures

Abstract: Functional oxide nanostructures include a thin film of a functional oxide, such as VO 2 , deposited on a semiconductor substrate, and metallic nanorings that cover the functional oxide thin films. The functional oxide exhibits a metal-insulator transition that causes a drop in resistance of about four orders of magnitude at a predetermined temperature. A method of creating such nanostructures include: synthesizing a thin film of the functional oxide on the substrate by reactive sputtering; selectively depositing nano-rings on the thin film, so that some portions of the thin film are covered with the nano-rings and other portions of the thin film remain uncovered by the nano-rings; and etching away the functional oxide from the uncovered portions of the thin film.

Room-temperature photoresponse of Schottky photodiodes based on GaNxAs1−x synthesized by ion implantation and pulsed-laser melting

Abstract: The spectral responsivity for Schottky photodiodes based on the GaNxAs1−x alloys synthesized using nitrogen (N) ion implantation followed by pulsed-laser melting and rapid thermal annealing is presented. An N-induced redshift up to 250 meV (180 nm) in the photocurrent onset energy (wavelength) is observed. The N concentration dependence agrees with the values measured by photomodulated reflectance and ballistic electron emission microscopy, and with the calculation by the band anticrossing model for the splitting of the conduction band in GaNxAs1−x.