We explore the interrelationships between the green 510 nm emission, the free‐carrier concentration, and the paramagnetic oxygen‐vacancy density in commercial ZnO phosphors by combining photoluminescence, optical‐absorption, and electron‐paramagnetic‐resonance spectroscopies. We find that the green emission intensity is strongly influenced by free‐carrier depletion at the particle surface, particularly for small particles and/or low doping. Our data suggest that the singly ionized oxygen vacancy is responsible for the green emission in ZnO; this emission results from the recombination of a photogenerated hole with the singly ionized charge state of this defect.

Mechanisms behind green photoluminescence in ZnO phosphor powders

Transparent electronics is today one of the most advanced topics for a wide range of device applications. The key components are wide bandgap semiconductors, where oxides of different origins play an important role, not only as passive component but also as active component, similar to what is observed in conventional semiconductors like silicon. Transparent electronics has gained special attention during the last few years and is today established as one of the most promising technologies for leading the next generation of flat panel display due to its excellent electronic performance. In this paper the recent progress in n- and p-type oxide based thin-film transistors (TFT) is reviewed, with special emphasis on solution-processed and p-type, and the major milestones already achieved with this emerging and very promising technology are summarizeed. After a short introduction where the main advantages of these semiconductors are presented, as well as the industry expectations, the beautiful history of TFTs is revisited, including the main landmarks in the last 80 years, finishing by referring to some papers that have played an important role in shaping transparent electronics. Then, an overview is presented of state of the art n-type TFTs processed by physical vapour deposition methods, and finally one of the most exciting, promising, and low cost but powerful technologies is discussed: solution-processed oxide TFTs. Moreover, a more detailed focus analysis will be given concerning p-type oxide TFTs, mainly centred on two of the most promising semiconductor candidates: copper oxide and tin oxide. The most recent data related to the production of complementary metal oxide semiconductor (CMOS) devices based on n- and p-type oxide TFT is also be presented. The last topic of this review is devoted to some emerging applications, finalizing with the main conclusions. Related work that originated at CENIMAT|I3N during the last six years is included in more detail, which has led to the fabrication of high performance n- and p-type oxide transistors as well as the fabrication of CMOS devices with and on paper.

Oxide Semiconductor Thin‐Film Transistors: A Review of Recent Advances

Solar cells based on organometallic halide perovskite absorber layers are emerging as a high-performance photovoltaic technology. Using highly sensitive photothermal deflection and photocurrent spectroscopy, we measure the absorption spectrum of CH3NH3PbI3 perovskite thin films at room temperature. We find a high absorption coefficient with particularly sharp onset. Below the bandgap, the absorption is exponential over more than four decades with an Urbach energy as small as 15 meV, which suggests a well-ordered microstructure. No deep states are found down to the detection limit of ∼1 cm–1. These results confirm the excellent electronic properties of perovskite thin films, enabling the very high open-circuit voltages reported for perovskite solar cells. Following intentional moisture ingress, we find that the absorption at photon energies below 2.4 eV is strongly reduced, pointing to a compositional change of the material.

Organometallic Halide Perovskites: Sharp Optical Absorption Edge and Its Relation to Photovoltaic Performance

Numerous candidates attempting to replace Si-based flash memory have failed for a variety of reasons over the years. Oxide-based resistance memory and the related memristor have succeeded in surpassing the specifications for a number of device requirements. However, a material or device structure that satisfies high-density, switching-speed, endurance, retention and most importantly power-consumption criteria has yet to be announced. In this work we demonstrate a TaO(x)-based asymmetric passive switching device with which we were able to localize resistance switching and satisfy all aforementioned requirements. In particular, the reduction of switching current drastically reduces power consumption and results in extreme cycling endurances of over 10(12). Along with the 10 ns switching times, this allows for possible applications to the working-memory space as well. Furthermore, by combining two such devices each with an intrinsic Schottky barrier we eliminate any need for a discrete transistor or diode in solving issues of stray leakage current paths in high-density crossbar arrays.

A fast, high-endurance and scalable non-volatile memory device made from asymmetric Ta2O5−x/TaO2−x bilayer structures

Graphene has been hailed as a wonderful material in electronics, and recently, it is the rising star in photonics, as well. The wonderful optical properties of graphene afford multiple functions of signal emitting, transmitting, modulating, and detection to be realized in one material. In this paper, the latest progress in graphene photonics, plasmonics, and broadband optoelectronic devices is reviewed. Particular emphasis is placed on the ability to integrate graphene photonics onto the silicon platform to afford broadband operation in light routing and amplification, which involves components like polarizer, modulator, and photodetector. Other functions like saturable absorber and optical limiter are also reviewed.

Graphene photonics, plasmonics, and broadband optoelectronic devices.

The theory for a sensitive spectroscopy based on the photothermal deflection of a laser beam is developed. We consider cw and pulsed cases of both transverse and collinear photothermal deflection spectroscopy for solids, liquids, gases, and thin films. The predictions of the theory are experimentally verified, its implications for imaging and microscopy are given, and the sources of noise are analyzed. The sensitivity and versatility of photothermal deflection spectroscopy are compared with thermal lensing and photoacoustic spectroscopy.

/pdf/photothermal-deflection-spectroscopy-and-detection-2wp6c469mu.pdf

Photothermal deflection spectroscopy and detection

We study the magnitude of metastable light-induced changes in undoped hydrogenated amorphous silicon (the Staebler-Wronski effect) with electron-spin-resonance and photoconductivity measurements. The influence of the following parameters is investigated in a systematic way: sample thickness, impurity content, illumination time, light intensity, photon energy, and illumination and annealing temperatures. The experimental results can be explained quantitatively by a model based on the nonradiative recombination of photoexcited carriers as the defect-creating step. In the framework of this model, the Staebler-Wronski effect is an intrinsic, self-limiting bulk process, characterized by a strongly sublinear dependence on the total light exposure of a sample. The experimental results suggest that the metastable changes are caused by recombination-induced breaking of weak Si--Si bonds, rather than by trapping of excess carriers in already existing defects. Hydrogen could be involved in the microscopic mechanism as a stabilizing element. The main metastable defect created by prolonged illumination is the silicon dangling bond. An analysis of the annealing behavior shows that a broad distribution of metastable dangling bonds exists, characterized by a variation of the energy barrier separating the metastable state from the stable ground state between 0.9 and 1.3 eV.

Light-induced metastable defects in hydrogenated amorphous silicon: A systematic study.

Organic devices promise to revolutionize the extent of, and access to, electronics by providing extremely inexpensive, lightweight and capable ubiquitous components that are printed onto plastic, glass or metal foils1,2,3. One key component of an electronic circuit that has thus far received surprisingly little attention is an organic electronic memory. Here we report an architecture for a write-once read-many-times (WORM) memory, based on the hybrid integration of an electrochromic polymer with a thin-film silicon diode deposited onto a flexible metal foil substrate. WORM memories are desirable for ultralow-cost permanent storage of digital images, eliminating the need for slow, bulky and expensive mechanical drives used in conventional magnetic and optical memories. Our results indicate that the hybrid organic/inorganic memory device is a reliable means for achieving rapid, large-scale archival data storage. The WORM memory pixel exploits a mechanism of current-controlled, thermally activated un-doping of a two-component electrochromic conducting polymer.

https://www.oocities.org/rocketrye12/22_PlasticMEMEMORIES.pdf

A polymer/semiconductor write-once read-many-times memory

We have measured the subgap otpical absorption of undoped, singly doped, and compensated hydrogenated amorphous silicon down to 0.6 eV using the sensitive technique of photothermal deflection spectroscopy. We show that this absorption is due to silicon dangling-bond defects located approx.1.4 eV below the conduction band. While doping also creates defects approx.1.4 eV below the conduction band, compensation removes them. The results suggest that for the undoped material the density-of-states maximum found in field-effect measurements is due to silicon dangling bonds.

/pdf/direct-measurement-of-gap-state-absorption-in-hydrogenated-2smd2g0973.pdf

Direct measurement of gap state absorption in hydrogenated amorphous silicon by photothermal deflection spectroscopy

In this paper we find that the stretched-exponential relaxation commonly observed in disordered systems is explained by time-dependent atomic diffusion. The relaxation is observed in the electronic properties of hydrogenated amorphous silicon (a-Si:H), a ``hydrogen glass'' material, and reflects the equlibration of localized electronic states. The relaxation is attributed to the motion of bonded hydrogen which exhibits dispersive diffusion with a characteristic power-law time dependence. A quantitative relation between the relaxation and the diffusion is established.

Warren B. Jackson

Papers

Photothermal deflection spectroscopy and detection

Light-induced metastable defects in hydrogenated amorphous silicon: A systematic study.

A polymer/semiconductor write-once read-many-times memory

Direct measurement of gap state absorption in hydrogenated amorphous silicon by photothermal deflection spectroscopy

Stretched-exponential relaxation arising from dispersive diffusion of hydrogen in amorphous silicon.