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Yang-Kyu Choi
Researcher at KAIST
Publications - 641
Citations - 23170
Yang-Kyu Choi is an academic researcher from KAIST. The author has contributed to research in topics: Field-effect transistor & MOSFET. The author has an hindex of 65, co-authored 617 publications receiving 19653 citations. Previous affiliations of Yang-Kyu Choi include Samsung & Kigali Institute of Science and Technology.
Papers
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Journal ArticleDOI
Metallic Ti3C2Tx MXene Gas Sensors with Ultrahigh Signal-to-Noise Ratio
Seon Joon Kim,Hyeong-Jun Koh,Chang E. Ren,Ohmin Kwon,Kathleen Maleski,Soo-Yeon Cho,Babak Anasori,Choong-Ki Kim,Yang-Kyu Choi,Jihan Kim,Yury Gogotsi,Hannes Jung +11 more
TL;DR: It is demonstrated that 2D metal carbide MXenes, which possess high metallic conductivity for low noise and a fully functionalized surface for a strong signal, greatly outperform the sensitivity of conventional semiconductor channel materials.
Journal ArticleDOI
Chemical sensors based on nanostructured materials
Xing-Jiu Huang,Yang-Kyu Choi +1 more
TL;DR: A comprehensive review of current research activities that concentrate on chemical sensors based on nanotubes, nanorods, nanobelts, and nanowires can be found in this paper.
Journal ArticleDOI
A polydimethylsiloxane (PDMS) sponge for the selective absorption of oil from water.
Sung-Jin Choi,Taehong Kwon,Hwon Im,Dong-Il Moon,David J. Baek,Myeong-Lok Seol,Juan P. Duarte,Yang-Kyu Choi +7 more
TL;DR: Through appropriately combining various sugar particles, the absorption capacity of the PDMS sponge is favorably optimized, enabling excellent recyclability and promoting potential in environmental applications.
Proceedings ArticleDOI
Sub 50-nm FinFET: PMOS
Xuejue Huang,Wen-Chin Lee,C. Kuo,D. Hisamoto,Leland Chang,J. Kedzierski,E. Anderson,Hideki Takeuchi,Yang-Kyu Choi,K. Asano,Vivek Subramanian,Tsu-Jae King,Jeffrey Bokor,Chenming Hu +13 more
TL;DR: In this article, a self-aligned double-gate MOSFET structure (FinFET) is used to suppress the short channel effect, and a 45 nm gate-length PMOS FinEET is presented.
Patent
Finfet transistor structures having a double gate channel extending vertically from a substrate and methods of manufacture
Chenming Hu,Tsu-Jae King,Vivek Subramanian,Leland Chang,Xuejue Huang,Yang-Kyu Choi,Jakub Tadeusz Kedzierski,Nick Lindert,Jeffrey Bokor,Wen-Chin Lee +9 more
TL;DR: In this article, a planar MOSFET is fabricated in a silicon layer overlying an insulating layer (e.g., SIMOX) with the device extending from the insulating layers as a fin.