Y
Yasuharu Suematsu
Researcher at Tokyo Institute of Technology
Publications - 255
Citations - 8820
Yasuharu Suematsu is an academic researcher from Tokyo Institute of Technology. The author has contributed to research in topics: Laser & Semiconductor laser theory. The author has an hindex of 42, co-authored 254 publications receiving 8695 citations. Previous affiliations of Yasuharu Suematsu include Sumitomo Electric Industries & Kōchi University.
Papers
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Analysis of semiconductor intersectional waveguide optical switch-modulator
TL;DR: In this article, the authors analyzed the transmission and reflection characteristics and wavelength chirping of a guided mode in a semiconductor intersectional optical switch-modulator by considering the electric field-induced refractive index variation along with the absorption loss variation.
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Single-wavelength operation of 1.53 μm gainasp/inp buried-heterostructure integrated twin-guide laser with distributed bragg reflector under direct modulation up to 1 ghz
TL;DR: In this paper, a twin-guide laser with distributed Bragg reflector was directly modulated with microwave modulation current superimposed on a DC bias which was fixed at 1.1 times the threshold current, and single-wavelength operation was experimentally confirmed with a modulation frequency up to 1 GHz and a modulation depth of 100%.
A New Structure for High-Power TW-SLA
TL;DR: In this article, an exponential tapered active layer was proposed to improve the saturation output power and quantum efficiency of a traveling-wave semiconductor laser amplifier by considering both the spatial distributions of the carrier density and the optical field.
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Conditions of LPE Growth for Lattice Matched GaInAsP/InP DH Lasers with (100) Substrate in the Range of 1.2–1.5 µm
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Measurements of refractive-index variation with free carrier density and temperature for 1.6 μm GaInAsP/InP lasers
TL;DR: In this article, the authors measured the refractive index variation with injected carrier density and temperature for GaInAsP/InP b.h. laser emitting at 1.6 μm.