Y
Yasuharu Suematsu
Researcher at Tokyo Institute of Technology
Publications - 255
Citations - 8820
Yasuharu Suematsu is an academic researcher from Tokyo Institute of Technology. The author has contributed to research in topics: Laser & Semiconductor laser theory. The author has an hindex of 42, co-authored 254 publications receiving 8695 citations. Previous affiliations of Yasuharu Suematsu include Sumitomo Electric Industries & Kōchi University.
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Very fine corrugations formed on InP by wet chemical etching and electron beam lithography
TL;DR: In this article, a thin GaInAs layer grown by MOVPE was used as an etching mask to suppress the undercut etching so as to form very fine structures, which were formed on InP using electron beam lithography and wet chemical etching.
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Narrow-beam divergence of the emission from low-threshold GaInAsP/InP double-heterostructure lasers
TL;DR: In this article, the angles of beam divergence perpendicular to the junction plane have been studied for low-threshold GaInAsP/InP double-heterostructure lasers with a thin active layer emitting at 1.31 μm.
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Random bend losses in single-mode optical-fibre cables: power-spectrum estimation from spectral losses
TL;DR: In this paper, the power spectra of random bends were estimated to be Gaussian with correlation lengths of around 1 mm, and the method was to fit measured curves of loss against wavelength to theoretical ones.
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OMVPE conditions for GaInAs/InP heterointerfaces and superlattices
TL;DR: In this paper, the OMVPE growth conditions and evaluation of GaInAs/InP superlattices were reported and the required pressure drop just after the bubbler for stable supply of metalorganic sources was confirmed experimentally.
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Ga x In 1-x As y P 1-y /InP terraced substrate single-mode laser
TL;DR: In this paper, an index-guiding structure capable of providing well-controlled single-mode operation has been realized for Ga x In 1-x AS y P 1-y /InP lasers ( x = 0.28, y =0.62, and \lambda = 1.3 \mu m) using a terraced substrate (TS) configuration prepared by single-step LPE growth.