Y
Yung-Cheng Lee
Researcher at University of Colorado Boulder
Publications - 240
Citations - 6677
Yung-Cheng Lee is an academic researcher from University of Colorado Boulder. The author has contributed to research in topics: Flip chip & Atomic layer deposition. The author has an hindex of 44, co-authored 240 publications receiving 6016 citations. Previous affiliations of Yung-Cheng Lee include University of Minnesota & DARPA.
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Al2O3 and TiO2 atomic layer deposition on copper for water corrosion resistance.
A. I. Abdulagatov,Y. Yan,Jill Cooper,Yadong Zhang,Zachary M. Gibbs,Andrew S. Cavanagh,Ronggui Yang,Yung-Cheng Lee,Steven M. George +8 more
TL;DR: Al( 2)O(3) and TiO(2) atomic layer deposition (ALD) were employed to develop an ultrathin barrier film on copper to prevent water corrosion and were found to be much more resilient to dissolution in water and prevented the water corrosion of copper.
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Three-Dimensional Ni/TiO2 Nanowire Network for High Areal Capacity Lithium Ion Microbattery Applications
TL;DR: 3-D porous anodic alumina template-assisted electrodeposition of Ni followed by TiO(2) coating using atomic layer deposition paves the way to build reliable 3-D nanostructured electrodes for high areal capacity microbatteries.
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Three-Dimensional Superhydrophobic Nanowire Networks for Enhancing Condensation Heat Transfer
TL;DR: In this article, a stable and efficient jumping droplet condensation on a superhydrophobic surface with three-dimensional (3D) copper nanowire networks was demonstrated for the first time.
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Enhanced bubble nucleation and liquid rewetting for highly efficient boiling heat transfer on two-level hierarchical surfaces with patterned copper nanowire arrays
Rongfu Wen,Qian Li,Wei Wang,Wei Wang,Benoit Latour,Calvin H. Li,Chen Li,Yung-Cheng Lee,Ronggui Yang +8 more
TL;DR: In this paper, a two-level hierarchical surface with patterned copper nanowire arrays for boiling heat transfer enhancement is developed, where microcavities are formed between short nanowires.
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Particle dynamics and particle heat and mass transfer in thermal plasmas. Part I. The motion of a single particle without thermal effects
Emil Pfender,Yung-Cheng Lee +1 more
TL;DR: In this article, the relative importance of various effects on particle motion was assessed in the context of thermal plasma processing of materials, and the results indicated that the correction term required for the viscous drag coefficient due to strongly varying properties is the most important factor; non-continuum effects are important for smaller particles and/or reduced pressures.