Journal ArticleDOI
CD characterization of nanostructures in SEM metrology
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TLDR
In this paper, the critical dimension (CD) of nanostructures from scanning electron microscopy (SEM) images is evaluated based on the physical modeling of the SEM image formation and evaluates both top and bottom CDs.Abstract:
A new algorithm is presented that evaluates the critical dimension (CD) of nanostructures from scanning electron microscopy (SEM) images. The algorithm is based on the physical modelling of the SEM image formation and evaluates both top and bottom CDs. The SEM intensity profile is modelled by a piecewise-defined continuous function which is approximated to the measured profile extracted from images by means of a least-squares fit. The algorithm is tested in a series of Monte Carlo simulations with respect to a variation of the edge-slope angle and the electron probe diameter. The maximum deviation between the modelled and the simulated top and bottom CDs is smaller than 3 nm. As an application example, measurements of silicon line structures are presented.read more
Citations
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Patent
Sequential Infiltration Synthesis for Advanced Lithography
TL;DR: In this article, a modified resist material is characterized by an improved resistance to a plasma etching or related process relative to the unmodified resist material, thereby allowing formation of patterned features into a substrate material.
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Ordered nanoscale domains by infiltration of block copolymers
TL;DR: In this article, a method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains is presented.
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Sequential infiltration synthesis for enhancing multiple-patterning lithography
TL;DR: Simplified methods of multiple-patterning photolithography using sequential infiltration synthesis to modify the photoresist such that it withstands plasma etching better than unmodified resist and replaces one or more hard masks and/or a freezing step in MPL processes are described in this paper.
Book ChapterDOI
TSEM: A Review of Scanning Electron Microscopy in Transmission Mode and Its Applications
TL;DR: In this article, the authors proposed a transmission electron imaging with standard scanning electron microscopes (SEMs) which can be implemented simply by equipping the SEM with a readily available transmission detector, called STEM-in-SEM or simply TSEM.
Journal ArticleDOI
Implant Surface Design Regulates Mesenchymal Stem Cell Differentiation and Maturation
TL;DR: The surface parameters of dental implant materials that contribute to improved cell response and osseointegration are reviewed and the noncanonical Wnt5a pathway has been implicated in osteoblastic differentiation of cells on titanium implant surfaces.
References
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Book
Monte Carlo Modeling for Electron Microscopy and Microanalysis
TL;DR: In this paper, the authors introduce Monte Carlo Methods and their application in the field of X-ray production and micro-analysis, including charge collection microscopy and Cathodoluminescence.
Journal ArticleDOI
X-ray continuum from thick elemental targets for 10-50-keV electrons
T. S. Rao‐Sahib,D. B. Wittry +1 more
TL;DR: In this paper, the x-ray continuum from thick elemental targets was investigated from 1-10 A using a crystal spectrometer and electron energies of 10-50 keV in an electron probe microanalyzer.
Journal ArticleDOI
Elastic scattering of electrons and positrons by atoms. Schrödinger and Dirac partial wave analysis
Francesc Salvat,Ricardo Mayol +1 more
TL;DR: In this paper, two FORTRAN 77 codes are described which provide a complete description of elastic scattering of electrons and positrons by atoms using the static field approximation with non-relativistic (Schrodinger) and relativistic partial wave analysis.
Journal ArticleDOI
Scanning electron microscope dimensional metrology using a model‐based library
TL;DR: This procedure has yielded measurement results from top-down SEM images that are in good agreement with cross-section measurements and that have as much as a factor of 3 better same-site repeatability than the more traditional techniques.