Journal ArticleDOI
Derivation of phase in computer-aided photoelasticity.
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TLDR
An operation is outlined to derive faultlessly the phase in computer-aided photoelasticity in interferometry when the intensity fields are that of squared sinusoidal modulation.Abstract:
Phase-shifting techniques have been successfully implemented to yield the phase from sinusoidally modulated intensity fields in interferometry. However, when the intensity fields are that of squared sinusoidal modulation, as in the case of photoelasticity, implementation of existing phase-shift operations will result in error. An operation is outlined to derive faultlessly the phase in computer-aided photoelasticity.read more
Citations
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Journal ArticleDOI
Photoelastic stress analysis using an object step-loading method
TL;DR: In this paper, an object step-loading method is introduced to overcome the problem of discontinuity in phase measurement, which hinders faultless phase unwrapping for stress determination in photoelasticity.
Journal ArticleDOI
Quantification of Hidden Whole‐Field Stress Inside Porous Geomaterials Via Three‐Dimensional Printing and Photoelastic Testing Methods
Journal ArticleDOI
Derivation of retardation phase in computer-aided photoelasticity by using carrier fringe phase shifting.
TL;DR: A technique in which a carrier fringe is used is demonstrated to reduce to four the number of fringe patterns required to derive the phase difference due to retardation in computer-aided photoelasticity.
Proceedings ArticleDOI
Analysis on the effect of extinction ratio in birefringent measurement by phase-stepping method
TL;DR: In this paper, the effects of extinction ratios of linear polarizer and analyzer in the measurement of birefringent retardance by a five-step phase-shifting method based on the plane polariscope is presented.
Proceedings ArticleDOI
Phase-stepping method for whole-field photoelastic stress analysis using plane polariscope setup
TL;DR: In this paper, a six-step phase shifting method is presented to determine the phase retardation for whole-field photoelastic stress analysis in optical glass based on the plane polariscope setup.